A. M. Engwall

734 total citations
29 papers, 539 citations indexed

About

A. M. Engwall is a scholar working on Mechanics of Materials, Materials Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, A. M. Engwall has authored 29 papers receiving a total of 539 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Mechanics of Materials, 19 papers in Materials Chemistry and 9 papers in Electrical and Electronic Engineering. Recurrent topics in A. M. Engwall's work include Metal and Thin Film Mechanics (21 papers), Diamond and Carbon-based Materials Research (12 papers) and Copper Interconnects and Reliability (9 papers). A. M. Engwall is often cited by papers focused on Metal and Thin Film Mechanics (21 papers), Diamond and Carbon-based Materials Research (12 papers) and Copper Interconnects and Reliability (9 papers). A. M. Engwall collaborates with scholars based in United States, China and Ireland. A. M. Engwall's co-authors include Eric Chason, Seth G. John, Paul R. Craddock, Olivier Rouxel, Edward A. Boyle, S. J. Shin, J. H. Bae, S. O. Kucheyev, L. B. Bayu Aji and T. Nishimura and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

A. M. Engwall

28 papers receiving 521 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
A. M. Engwall United States	13	252	221	150	104	92	29	539
Tetsuo Yamazaki Japan	12	323 1.3×	157 0.7×	142 0.9×	78 0.8×	54 0.6×	42	473
J. D. Fitz Gerald Australia	18	124 0.5×	291 1.3×	95 0.6×	53 0.5×	44 0.5×	30	1.0k
Shande Liu China	22	99 0.4×	261 1.2×	720 4.8×	244 2.3×	492 5.3×	86	1.6k
Suian Zhang China	14	227 0.9×	100 0.5×	122 0.8×	31 0.3×	13 0.1×	37	580
K. Helming Germany	13	206 0.8×	287 1.3×	70 0.5×	39 0.4×	10 0.1×	44	554
Jack Lee United States	13	90 0.4×	147 0.7×	342 2.3×	24 0.2×	16 0.2×	39	696
Guiqin Wang China	18	31 0.1×	138 0.6×	91 0.6×	378 3.6×	79 0.9×	53	947
Weiyan Chen China	9	223 0.9×	114 0.5×	41 0.3×	33 0.3×	17 0.2×	26	396
P. Rey Spain	17	71 0.3×	287 1.3×	70 0.5×	18 0.2×	79 0.9×	50	1.0k

Countries citing papers authored by A. M. Engwall

Since Specialization

Citations

This map shows the geographic impact of A. M. Engwall's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. M. Engwall with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. M. Engwall more than expected).

Fields of papers citing papers by A. M. Engwall

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. M. Engwall. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. M. Engwall. The network helps show where A. M. Engwall may publish in the future.

Co-authorship network of co-authors of A. M. Engwall

This figure shows the co-authorship network connecting the top 25 collaborators of A. M. Engwall. A scholar is included among the top collaborators of A. M. Engwall based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. M. Engwall. A. M. Engwall is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Kawasaki, K., S. González, L. B. Bayu Aji, et al.. (2025). High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates. Journal of Applied Physics. 138(10). 1 indexed citations

Shin, S. J., L. B. Bayu Aji, J. H. Bae, et al.. (2024). Magnetron sputter deposition of boron carbide in Ne and Ar plasmas. Journal of Applied Physics. 135(8). 6 indexed citations

Shin, S. J., J. H. Bae, A. M. Engwall, et al.. (2024). Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects. Journal of Applied Physics. 135(3). 5 indexed citations

Aji, L. B. Bayu, et al.. (2024). Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(4). 4 indexed citations

Engwall, A. M., et al.. (2024). Effects of growth rate and dynamic substrate tilt on properties of Au-Ta alloy films deposited by high-power impulse magnetron sputtering. Surface and Coatings Technology. 493. 131231–131231.

Aji, L. B. Bayu, S. J. Shin, J. H. Bae, et al.. (2023). Radio-frequency magnetron sputter deposition of ultrathick boron carbide films. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(2). 11 indexed citations

Shin, S. J., L. B. Bayu Aji, A. M. Engwall, et al.. (2023). Ultrathick Boron Carbide Coatings for Nuclear Fusion Targets. Fusion Science & Technology. 79(7). 841–852. 8 indexed citations

Shin, S. J., L. B. Bayu Aji, A. M. Engwall, et al.. (2022). Reactive co-sputtering of ternary Au–Ta–O films with tunable electrical resistivity. Applied Physics Letters. 121(14). 1 indexed citations

Aji, L. B. Bayu, S. J. Shin, J. H. Bae, et al.. (2022). Effect of substrate temperature on sputter-deposited boron carbide films. Journal of Applied Physics. 131(7). 13 indexed citations

10.

Baker, Alexander A., A. M. Engwall, L. B. Bayu Aji, et al.. (2022). Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering. Coatings. 12(7). 917–917. 5 indexed citations

11.

Bae, J. H., L. B. Bayu Aji, S. J. Shin, et al.. (2021). Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering. Journal of Applied Physics. 130(16). 9 indexed citations

12.

Shin, S. J., L. B. Bayu Aji, J. H. Bae, et al.. (2021). Oblique angle deposition of boron carbide films by magnetron sputtering. Journal of Applied Physics. 130(12). 15 indexed citations

13.

Engwall, A. M., L. B. Bayu Aji, Alexander A. Baker, et al.. (2021). Effect of substrate tilt on sputter-deposited AuTa films. Applied Surface Science. 547. 149010–149010. 13 indexed citations

14.

Aji, L. B. Bayu, A. M. Engwall, J. H. Bae, et al.. (2020). Sputtered Au–Ta films with tunable electrical resistivity. Journal of Physics D Applied Physics. 54(7). 75303–75303. 12 indexed citations

15.

Engwall, A. M., L. B. Bayu Aji, S. J. Shin, et al.. (2020). Sputter-deposited low-stress boron carbide films. Journal of Applied Physics. 128(17). 18 indexed citations

16.

Engwall, A. M., et al.. (2019). Enhanced properties of tungsten films by high-power impulse magnetron sputtering. Surface and Coatings Technology. 363. 191–197. 33 indexed citations

17.

Chason, Eric, et al.. (2018). Kinetic model for thin film stress including the effect of grain growth. Journal of Applied Physics. 123(18). 35 indexed citations

18.

Engwall, A. M., et al.. (2016). Origins of residual stress in thin films: Interaction between microstructure and growth kinetics. Materials & Design. 110. 616–623. 78 indexed citations

19.

John, Seth G., Olivier Rouxel, Paul R. Craddock, A. M. Engwall, & Edward A. Boyle. (2007). Zinc stable isotopes in seafloor hydrothermal vent fluids and chimneys. Earth and Planetary Science Letters. 269(1-2). 17–28. 139 indexed citations

20.

John, Seth G., et al.. (2006). Distribution and fractionation of Zn stable isotopes in the oceans. AGUFM. 2006. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact