A. Krokhmal

528 total citations
28 papers, 450 citations indexed

About

A. Krokhmal is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Control and Systems Engineering. According to data from OpenAlex, A. Krokhmal has authored 28 papers receiving a total of 450 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 20 papers in Atomic and Molecular Physics, and Optics and 16 papers in Control and Systems Engineering. Recurrent topics in A. Krokhmal's work include Plasma Diagnostics and Applications (18 papers), Gyrotron and Vacuum Electronics Research (16 papers) and Pulsed Power Technology Applications (16 papers). A. Krokhmal is often cited by papers focused on Plasma Diagnostics and Applications (18 papers), Gyrotron and Vacuum Electronics Research (16 papers) and Pulsed Power Technology Applications (16 papers). A. Krokhmal collaborates with scholars based in Israel, Russia and Ukraine. A. Krokhmal's co-authors include J. Felsteiner, Ya. E. Krasik, J. Z. Gleizer, A. Dunaevsky, S.D. Korovin, I.V. Pegel, A. V. Gunin, D. Yarmolich, V. Bernshtam and V. I. Gushenets and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

A. Krokhmal

27 papers receiving 433 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A. Krokhmal Israel 12 342 258 248 88 58 28 450
C. Schultheiss United States 9 321 0.9× 271 1.1× 162 0.7× 114 1.3× 55 0.9× 26 454
G. Kirkman United States 11 380 1.1× 406 1.6× 272 1.1× 136 1.5× 34 0.6× 31 501
M. LaCour United States 12 303 0.9× 378 1.5× 314 1.3× 88 1.0× 89 1.5× 22 512
M. Ruebush United States 11 355 1.0× 379 1.5× 383 1.5× 84 1.0× 52 0.9× 17 519
I. V. Grekhov Russia 9 283 0.8× 171 0.7× 263 1.1× 61 0.7× 64 1.1× 53 405
D. P. Chakravarthy India 13 310 0.9× 299 1.2× 335 1.4× 62 0.7× 37 0.6× 59 491
V. Vekselman Israel 16 510 1.5× 236 0.9× 184 0.7× 368 4.2× 80 1.4× 41 643
S.D. Korovin Russia 11 373 1.1× 526 2.0× 483 1.9× 66 0.8× 33 0.6× 29 628
R. J. Adler United States 10 211 0.6× 201 0.8× 170 0.7× 17 0.2× 66 1.1× 49 387
В. И. Кузнецов Russia 10 214 0.6× 214 0.8× 84 0.3× 50 0.6× 44 0.8× 55 328

Countries citing papers authored by A. Krokhmal

Since Specialization
Citations

This map shows the geographic impact of A. Krokhmal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Krokhmal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Krokhmal more than expected).

Fields of papers citing papers by A. Krokhmal

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Krokhmal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Krokhmal. The network helps show where A. Krokhmal may publish in the future.

Co-authorship network of co-authors of A. Krokhmal

This figure shows the co-authorship network connecting the top 25 collaborators of A. Krokhmal. A scholar is included among the top collaborators of A. Krokhmal based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Krokhmal. A. Krokhmal is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Krokhmal, A., et al.. (2017). Crystalline damage in silicon wafers and 'rare event' failure introduced by low-energy mechanical impact. Materials Science in Semiconductor Processing. 63. 40–44. 5 indexed citations
2.
Wormington, Matthew, A. Krokhmal, Paul Ryan, et al.. (2011). A Novel X-ray Diffraction and Reflectivity Tool for Front-End of Line Metrology. AIP conference proceedings. 198–203. 2 indexed citations
3.
Krasik, Ya. E., D. Yarmolich, V. Vekselman, et al.. (2007). Passive and Active Plasma Emission Sources for High-current Electron Beam Generation. IEEJ Transactions on Fundamentals and Materials. 127(11). 697–703. 5 indexed citations
4.
Krasik, Ya. E., J. Z. Gleizer, D. Yarmolich, et al.. (2005). Characterization of the plasma on dielectric fiber (velvet) cathodes. Journal of Applied Physics. 98(9). 59 indexed citations
5.
Gleizer, J. Z., D. Yarmolich, A. Krokhmal, Ya. E. Krasik, & J. Felsteiner. (2005). Optimization of a low-pressure hollow-anode electrical discharge for generation of high-current electron beams. Journal of Physics D Applied Physics. 38(2). 276–286. 10 indexed citations
6.
Krasik, Ya. E., J. Z. Gleizer, A. Krokhmal, et al.. (2004). High-current electron sources based on gaseous discharges. Vacuum. 77(4). 391–398. 8 indexed citations
7.
Krokhmal, A., et al.. (2004). Grid-controlled electron emission from a hollow-anode electron source. Journal of Applied Physics. 95(7). 3304–3310. 12 indexed citations
8.
Krokhmal, A., J. Z. Gleizer, Ya. E. Krasik, et al.. (2004). Spectroscopic investigation of the plasma in a hollow anode with an incorporated ferroelectric plasma source. Journal of Applied Physics. 96(7). 4021–4023. 12 indexed citations
9.
Krasik, Ya. E., et al.. (2003). Electron beam generation in a diode with different ferroelectric cathodes. Journal of Applied Physics. 94(8). 5158–5162. 9 indexed citations
10.
Gleizer, J. Z., A. Krokhmal, Ya. E. Krasik, & J. Felsteiner. (2003). Investigation of a hollow anode with an incorporated ferroelectric plasma source for generation of high-current electron beams. Journal of Applied Physics. 94(10). 6319–6327. 19 indexed citations
11.
Krokhmal, A., J. Z. Gleizer, Ya. E. Krasik, J. Felsteiner, & V. I. Gushenets. (2003). Electron beam generation in a diode with a gaseous plasma electron source I: Plasma source based on a hollow anode ignited by a multi-arc system. Journal of Applied Physics. 94(1). 44–54. 21 indexed citations
12.
13.
Gleizer, J. Z., A. Krokhmal, Ya. E. Krasik, & J. Felsteiner. (2002). High-current electron beam generation by a pulsed hollow cathode. Journal of Applied Physics. 91(5). 3431–3443. 8 indexed citations
14.
Krokhmal, A., J. Z. Gleizer, Ya. E. Krasik, & J. Felsteiner. (2002). Low-pressure, high-current hollow cathode with a ferroelectric plasma source. Applied Physics Letters. 81(23). 4341–4343. 11 indexed citations
15.
Krasik, Ya. E., et al.. (2002). Application of a ferroelectric plasma cathode as a high-current switch. The European Physical Journal D. 19(1). 89–95. 14 indexed citations
16.
Krokhmal, A., et al.. (2001). The impurity optical absorption and conduction band structure in 6H-SiC. Semiconductors. 35(11). 1242–1248. 8 indexed citations
17.
Krasik, Ya. E., A. Dunaevsky, A. Krokhmal, et al.. (2001). Emission properties of different cathodes at E⩽105 V/cm. Journal of Applied Physics. 89(4). 2379–2399. 149 indexed citations
18.
Dunaevsky, A., Ya. E. Krasik, A. Krokhmal, et al.. (2000). Emission properties of metal-ceramic, velvet, and carbon fiber cathodes. International Conference on High-Power Particle Beams. 516–519.
19.
Krasik, Ya. E., A. Dunaevsky, J. Felsteiner, et al.. (2000). Study of electron diodes with a ferroelectric plasma cathode. IEEE Transactions on Plasma Science. 28(5). 1642–1647. 12 indexed citations
20.
Krokhmal, A., et al.. (2000). Excitons in monoclinic zinc diphosphide: Orthoexciton and polariton effects at n=1 resonance. Physics of the Solid State. 42(9). 1625–1633. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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