Ted Liang

Surface Chemistry of Ruthenium Dioxide in Heterogeneous Catalysis and Electrocatalysis: From Fundamental to Applied Research

Nanometer-scale lithography on microscopically clean graphene

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Selective Functionalization of Tailored Nanostructures

At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy

Solvothermal growth of a ruthenium metal–organic framework featuring HKUST-1 structure type as thin films on oxide surfaces

Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness

Structuring of metal–organic frameworks at the mesoscopic/macroscopic scale

Tungsten Diselenide Patterning and Nanoribbon Formation by Gas‐Assisted Focused‐Helium‐Ion‐Beam‐Induced Etching

g‐C₃N₄‐Based Heterostructured Photocatalysts

Molecule-by-Molecule Writing Using a Focused Electron Beam

Gas-assisted focused electron beam and ion beam processing and fabrication

Synthesis and Porous Properties of Chromium Azolate Porous Coordination Polymers

Charging effects during focused electron beam induced deposition of silicon oxide

Water Desalination across Nanoporous Graphene

Coherent Excitation and Control of Plasmons on Gold Using Two-Dimensional Transition Metal Dichalcogenides

Graphitic Carbon Nitride (g-C₃N₄)-Based Photocatalysts for Artificial Photosynthesis and Environmental Remediation: Are We a Step Closer To Achieving Sustainability?

Applications of 2D MXenes in energy conversion and storage systems

The Chemistry and Applications of Metal-Organic Frameworks

Compact high-repetition-rate source of coherent 100 eV radiation

Influence of Rh nanoparticle size and composition on the photocatalytic water splitting performance of Rh/graphitic carbon nitride

Metal–Organic Framework Derived Hybrid Co₃O₄-Carbon Porous Nanowire Arrays as Reversible Oxygen Evolution Electrodes

A critical literature review of focused electron beam induced deposition

Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

Pattern Inspection of EUV Masks Using DUV Light

Progress in extreme ultraviolet mask repair using a focused ion beam

The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks

Damage-free mask repair using electron-beam-induced chemical reactions

E-beam mask repair: fundamental capability and applications

Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks

Advanced photolithographic mask repair using electron beams

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector