Citation Impact

Citing Papers

Epitaxial core–shell and core–multishell nanowire heterostructures
2002 StandoutNature
Electrodeposition of Ge, Si and SixGe1−x from an air- and water-stable ionic liquid
2008
Nanometre-scale electronics with III–V compound semiconductors
2011 Nature
Ionic-liquid materials for the electrochemical challenges of the future
2009 Standout
The ReaxFF reactive force-field: development, applications and future directions
2016 Standout
Designing nanostructured Si anodes for high energy lithium ion batteries
2012 Standout
Structure and Nanostructure in Ionic Liquids
2015 Standout
SiGe Technology: Heteroepitaxy and High-Speed Microelectronics
2000
Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors
2004
Analysis of enhanced light emission from highly strained germanium microbridges
2013
Improving Estimation of Vehicle's Trajectory Using the Latest Global Positioning System With Kalman Filtering
2011
Spatial Control of Multiphoton Electron Excitations in InAs Nanowires by Varying Crystal Phase and Light Polarization
2017 StandoutNobel
Anisotropic Lithium Insertion Behavior in Silicon Nanowires: Binding Energy, Diffusion Barrier, and Strain Effect
2011
Deep Learning-Powered Vessel Trajectory Prediction for Improving Smart Traffic Services in Maritime Internet of Things
2022 Standout
Compositionally graded relaxed AlGaN buffers on semipolar GaN for mid-ultraviolet emission
2012 StandoutNobel
Excess carrier lifetimes in Ge layers on Si
2014
Lasing in direct-bandgap GeSn alloy grown on Si
2015 Standout
III–V compound semiconductor transistors—from planar to nanowire structures
2014

Works of T. Hackbarth being referenced

Results of a Precrash Application Based on Laser Scanner and Short-Range Radars
2009
Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices
2004
High f max n -type Si/SiGeMODFETs
1997
High performance 0.25 µm p -type Ge/SiGeMODFETs
1998
Strain relieved SiGe buffers for Si-based heterostructure field-effect transistors
1999
Strain relaxation mechanism for hydrogen-implanted Si1−xGex/Si(100) heterostructures
2000
Rankless by CCL
2026