Citation Impact
Citing Papers
Promises and prospects of two-dimensional transistors
2021 Nature
Electron photoemission from conducting nitrides (TiNx,TaNx) into SiO2 and HfO2
2005
High-k properties of atomic-layer-deposited HfO2 films using a nitrogen-containing Hf[N(CH3)2]4 precursor and H2O oxidant
2003
Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments
2004
Cubic/Tetragonal Phase Stabilization in High-κ ZrO2 Thin Films Grown Using O3-Based Atomic Layer Deposition
2011
High dielectric constant oxides
2004 Standout
Atomic Layer Deposition Functionalized Composite SOFC Cathode La0.6Sr0.4Fe0.8Co0.2O3-δ -Gd0.2Ce0.8O1.9: Enhanced Long-Term Stability
2013 StandoutNobel
Impact of interface structure on Schottky-barrier height for Ni∕ZrO2(001) interfaces
2005
Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water
2004
A Dual-Metal Gate Integration Process for CMOS With Sub-1-nm EOT<tex>$hbox HfO_2$</tex>by Using HfN Replacement Gate
2004
Increasing permittivity in HfZrO thin films by surface manipulation
2009
Atomic Layer Deposition: An Overview
2009 Standout
Advantages of HfAlON gate dielectric film for advanced low power CMOS application
2005
Fermi level pinning and Hf–Si bonds at HfO2: Polycrystalline silicon gate electrode interfaces
2004
Ferroelectricity in hafnium oxide thin films
2011 Standout
Fermi Pinning-Induced Thermal Instability of Metal-Gate Work Functions
2004
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Threshold voltage instabilities in high-/spl kappa/ gate dielectric stacks
2005
Photoelectrocatalytic Materials for Solar Water Splitting
2018
Ti gate compatible with atomic-layer-deposited HfO2 for n-type metal-oxide-semiconductor devices
2005
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Oxygen defects and Fermi level location in metal-hafnium oxide-silicon structures
2005
Structural and electrical characterization of Al2O3/HfO2/Al2O3 on strained SiGe
2004
Impact of oxygen on the work functions of Mo in vacuum and on ZrO2
2005
Potential imaging of Si∕HfO2/polycrystalline silicon gate stacks: Evidence for an oxide dipole
2005
Ultralow-Power Cryogenic Thermometry Based on Optical-Transition Broadening of a Two-Level System in Diamond
2023 StandoutNobel
Interface structure and non-stoichiometry in HfO2 dielectrics
2004
Atomic Layer Deposition of Iridium Thin Films
2004
Thermally robust TaTb/sub x/N metal gate electrode for n-MOSFETs applications
2005
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water
2004
Toward practical solar hydrogen production – an artificial photosynthetic leaf-to-farm challenge
2019 Standout
Works of S. Samavedam being referenced
Fermi-Level Pinning at the Polysilicon/Metal–Oxide Interface—Part II
2004
14-nm FinFET Technology for Analog and RF Applications
2017
Impact of Zr addition on properties of atomic layer deposited HfO2
2006
Physical and electrical properties of metal gate electrodes on HfO2 gate dielectrics
2002
Compatibility of silicon gates with hafnium-based gate dielectrics
2003
Hafnium zirconate gate dielectric for advanced gate stack applications
2007
Fermi-Level Pinning at the Polysilicon/Metal Oxide Interface—Part I
2004
Compatibility of polycrystalline silicon gate deposition with HfO2 and Al2O3/HfO2 gate dielectrics
2002
Contributions to the effective work function of platinum on hafnium dioxide
2004