Citation Impact
Citing Papers
Variable charge many-body interatomic potentials
2012
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Alternative Plasmonic Materials: Beyond Gold and Silver
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Photocatalytic water splitting with a quantum efficiency of almost unity
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Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier dystem
2009 StandoutNobel
Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
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Platinum single-atom and cluster catalysis of the hydrogen evolution reaction
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Two-Dimensional Molecular Electronics Circuits
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Photocatalytic solar hydrogen production from water on a 100-m2 scale
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Prospects of Colloidal Nanocrystals for Electronic and Optoelectronic Applications
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High-k properties of atomic-layer-deposited HfO2 films using a nitrogen-containing Hf[N(CH3)2]4 precursor and H2O oxidant
2003
The ReaxFF reactive force-field: development, applications and future directions
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IR permittivities for silicides and doped silicon
2010
Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments
2004
High dielectric constant oxides
2004 Standout
Ferroelectric non-volatile memories for low-voltage, low-power applications
1995
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
2004
Enabling nanotechnology with self assembled block copolymer patterns
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Charge-optimized many-body potential for the hafnium/hafnium oxide system
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Resistance Switching Behaviors of Hafnium Oxide Films Grown by MOCVD for Nonvolatile Memory Applications
2007
Atomic Layer Deposition Functionalized Composite SOFC Cathode La0.6Sr0.4Fe0.8Co0.2O3-δ -Gd0.2Ce0.8O1.9: Enhanced Long-Term Stability
2013 StandoutNobel
Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water
2004
Switching Devices Based on Interlocked Molecules
2001 StandoutNobel
A Dual-Metal Gate Integration Process for CMOS With Sub-1-nm EOT<tex>$hbox HfO_2$</tex>by Using HfN Replacement Gate
2004
Increasing permittivity in HfZrO thin films by surface manipulation
2009
Atomic Layer Deposition: An Overview
2009 Standout
Hafnium oxide gate dielectrics on sulfur-passivated germanium
2006
Ferroelectricity in hafnium oxide thin films
2011 Standout
Comparison between atomic-layer-deposited HfO2 films using O3 or H2O oxidant and Hf[N(CH3)2]4 precursor
2004
Fermi Pinning-Induced Thermal Instability of Metal-Gate Work Functions
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Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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X-ray nanolithography: Extension to the limits of the lithographic process
1996
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Structure, electronic properties and electron energy loss spectra of transition metal nitride films
2012
In-memory computing with resistive switching devices
2018 Standout
Low dielectric constant polymers for microelectronics
2001 Standout
Rapid isothermal processing
1988
Interface structure and non-stoichiometry in HfO2 dielectrics
2004
Atomic Layer Deposition of Iridium Thin Films
2004
Thermally robust TaTb/sub x/N metal gate electrode for n-MOSFETs applications
2005
Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films
2005
Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films
2004
Works of R. Gregory being referenced
HfO[sub 2] Gate Dielectrics Deposited via Tetrakis Diethylamido Hafnium
2003
Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds
1995
Impact of Zr addition on properties of atomic layer deposited HfO2
2006
Grain growth during transient annealing of As-implanted polycrystalline silicon films
1984
Fast diffusion of As in polycrystalline silicon during rapid thermal annealing
1984
Physical and electrical properties of metal gate electrodes on HfO2 gate dielectrics
2002
Optical properties of bulk and thin-film SrTiO3 on Si and Pt
2000
Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2]
2004
Impact of film properties of atomic layer deposited HfO2 resulting from annealing with a TiN capping layer
2006
Combined experimental and theoretical study of thin hafnia films
2008
Materials interactions in the integration of PZT ferroelectric capacitors
1995
Effectiveness of reactive sputter-deposited Ta–N films as diffusion barriers for Ag metallization
2004
Electronic, optical, and surface properties of PtSi thin films
2008