Citation Impact
Citing Papers
Chromatic aberrations correction of attosecond high-order harmonic beams by flat-top spatial shaping of the fundamental beam
2023 StandoutNobel
Why gold nanoparticles are more precious than pretty gold: Noble metal surface plasmon resonance and its enhancement of the radiative and nonradiative properties of nanocrystals of different shapes
2005 Standout
Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses
2006 StandoutNobel
At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy
2007
Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system
2002
Metallic-Type Oscillatory Interlayer Exchange Coupling across an Epitaxial FeSi Spacer
2001 StandoutNobel
Soft-x-ray polarimeter with multilayer optics: complete analysis of the polarization state of light
1999
Enhanced antiferromagnetic exchange coupling in Fe/Si/Fe epitaxial trilayers with Fe0.5Si0.5 boundary layers
2002 StandoutNobel
Organic materials for electronic and optoelectronic devices
2000 Standout
New Approaches to Nanofabrication: Molding, Printing, and Other Techniques
2005 Standout
Magnetic properties of Fe films and Fe∕Si∕Fe trilayers grown on GaAs(001) and MgO(001) by ion-beam sputter epitaxy
2006 StandoutNobel
In situ reflectance measurements of soft-x-ray/extreme-ultraviolet Mo/Y multilayer mirrors
1995
Micro Total Analysis Systems. 1. Introduction, Theory, and Technology
2002 Standout
Atomic Layer Deposition: An Overview
2009 Standout
Improved reflectance and stability of Mo-Si multilayers
2002
Lanthanum–molybdenum multilayer mirrors for attosecond pulses between 80 and 130 eV
2011 StandoutNobel
Optimisation of depth-graded multilayer coatings for broadband reflectivity in the soft X-ray and EUV regions
2000
Nanosphere Lithography: A Versatile Nanofabrication Tool for Studies of Size-Dependent Nanoparticle Optics
2001 Standout
Non-oscillatory antiferromagnetic coupling in sputtered Fe/Si superlattices
1992
Very strong interlayer exchange coupling in epitaxial Fe/Fe1−xSix/Fe trilayers (x=0.4–1.0)
2002 StandoutNobel
Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography
2001
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Layered magnetic structures: interlayer exchange coupling and giant magnetoresistance
1995 StandoutNobel
Tunneling in epitaxial Fe/Si/Fe structures with strong antiferromagnetic interlayer coupling
2003 StandoutNobel
Image formation in EUV lithography: Multilayer and resist properties
2000
Two-color pump-probe experiments in helium using high-order harmonics
2003 StandoutNobel
Chemistry and Properties of Nanocrystals of Different Shapes
2005 Standout
Lithographic Imaging Techniques for the Formation of Nanoscopic Features
1999
Atomic layer epitaxy of AlP and its application to X-ray multilayer mirror
1997
X27A—A new hard X-ray micro-spectroscopy facility at the National Synchrotron Light Source
2006 StandoutNobel
Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology
2012
Compact high-repetition-rate source of coherent 100 eV radiation
2013 StandoutNobel
Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction
2003
Instrumental aspects of x-ray microbeams in the range above 1 keV
1999
X-rays and extreme ultraviolet radiation: principles and applications
2016
Molybdenum–strontium multilayer mirrors for the 8–12-nm extreme-ultraviolet wavelength region
2001
Works of Patrick A. Kearney being referenced
8~12nm波長領域用のMo/Y多層膜鏡
1994
Mo/Y multilayer mirrors for the 8–12-nm wavelength region
1994
Mo/Y multilayer mirrors for the 8–12-nm wavelength region
1994
Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers
2001
Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region
1996
<title>High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography</title>
2000
EUV and non-EUV inspection of reticle defect repair sites
2007
Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers
1997
Interfaces in Mo/Si multilayers
1991
EUV mask absorber defect size requirement at 100-nm design rules
1998
Growth of molybdenum on silicon: Structure and interface formation
1991
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements
2006