Citation Impact

Citing Papers

Electronics based on two-dimensional materials
2014 Standout
Highly active oxide photocathode for photoelectrochemical water reduction
2011 Standout
Nanometre-scale electronics with III–V compound semiconductors
2011 Nature
High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals
2012 Standout
Platinum single-atom and cluster catalysis of the hydrogen evolution reaction
2016 Standout
The ReaxFF reactive force-field: development, applications and future directions
2016 Standout
Atomic Layer Deposition of Dielectrics on Ge and III–V Materials for Ultrahigh Performance Transistors
2009
On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates
2008
Graphene Cathode-Based ZnO Nanowire Hybrid Solar Cells
2012 StandoutNobel
Atomic Layer Deposition: An Overview
2009 Standout
Extraction of Channel Electron Effective Mobility in InGaAs/Al $_{\bf 2}$O$_{\bf 3}$ n-FinFETs
2013
Spatial Control of Multiphoton Electron Excitations in InAs Nanowires by Varying Crystal Phase and Light Polarization
2017 StandoutNobel
Selective growth of ZnO nanorods on SiO2/Si substrates using a graphene buffer layer
2011
Stabilizing Nanostructured Solid Oxide Fuel Cell Cathode with Atomic Layer Deposition
2013 StandoutNobel
III–V compound semiconductor transistors—from planar to nanowire structures
2014
High Performance Multilayer MoS2 Transistors with Scandium Contacts
2012 Standout
Porous Anodic Aluminum Oxide: Anodization and Templated Synthesis of Functional Nanostructures
2014 Standout

Works of P. D. Ye being referenced

Capacitance-voltage studies on enhancement-mode InGaAs metal-oxide-semiconductor field-effect transistor using atomic-layer-deposited Al2O3 gate dielectric
2006
S passivation of GaAs and band bending reduction upon atomic layer deposition of HfO2/Al2O3 nanolaminates
2008
First experimental demonstration of gate-all-around III–V MOSFETs by top-down approach
2011
Minority-carrier characteristics of InGaAs metal-oxide-semiconductor structures using atomic-layer-deposited Al2O3 gate dielectric
2006
Rankless by CCL
2026