N. Revil

Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits

High dielectric constant oxides

Power-Up SRAM State as an Identifying Fingerprint and Source of True Random Numbers

Physical Unclonable Functions and Applications: A Tutorial

Physical unclonable functions

High dielectric constant gate oxides for metal oxide Si transistors

Modeling attacks on physical unclonable functions

Low dielectric constant materials for microelectronics

Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides

Wet or dry ultrathin oxides: impact on gate oxide and device reliability

Interface Trap Generation and Hole Trapping Under NBTI and PBTI in Advanced CMOS Technology With a 2-nm Gate Oxide