Minoru Toriumi

Spiropyran-based dynamic materials

Olefin metathesis

Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists:  Material Design Challenges and Lithographic Evaluation at 157 nm

Experimental determination of ionization cluster size distributions in counting gases

New Approaches to Nanofabrication:  Molding, Printing, and Other Techniques

Functional fluoropolymers for fuel cell membranes

Optical dephasing and photon echoes from energetically and substitutionally disordered crystals

Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist

New Photoresist Materials for 157-nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] Partially Protected with tert-Butoxycarbonyl

Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo[4.2.1.0^2,5]non-7-enes

Ethenesulfonyl Fluoride (ESF): An On-Water Procedure for the Kilogram-Scale Preparation

Electron attachment to oxygen, water, and methanol, in various drift chamber gas mixtures

The Evolution of Materials for the Photolithographic Process

Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes

Multiresponsive Spiropyran-Based Copolymers Synthesized by Atom Transfer Radical Polymerization

Proposed method for molecular optical imaging

Introducing 157 nm Full Field Lithography

Toward Nanometer-Scale Optical Photolithography:  Utilizing the Near-Field of Bowtie Optical Nanoantennas

Review of the proton exchange membranes for fuel cell applications

Fluoropolymers for 157 nm single-layer resists

Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography

Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer

Resist materials for 157-nm lithography

Novel main-chain-fluorinated polymers for 157-nm photoresists

Characterization of fluoropolymers for 157 nm chemically amplified resist

Dry-etch resistance of fluorine functionalized polymers

Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics

Photochromism of spirooxazine in polymar matrices.

157-nm single-layer resists based on advanced fluorinated polymers

Dissolution characteristics of resist polymers studied by quartz crystal microbalance transmission-line analysis and pK a acidity analysis

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Thermal electron attachment to van der Waals molecules (O2⋅C2H4)

Fluoropolymer resists for 157-nm lithography

Thermal electron attachment to van der Waals molecules (O2⋅N2)