Citation Impact
Citing Papers
Adsorbent Materials for Carbon Dioxide Capture from Large Anthropogenic Point Sources
2009 Standout
New insights into the structure and reduction of graphite oxide
2009 Standout
Fluorescent Carbon Nanoparticles Derived from Candle Soot
2007 Standout
Removal of lead from aqueous solutions on palm shell activated carbon
2005 Standout
Biochar as a sorbent for contaminant management in soil and water: A review
2013 Standout
Remediation of heavy metal(loid)s contaminated soils – To mobilize or to immobilize?
2013 Standout
Definitive Molecular Level Characterization of Defects in UiO‐66 Crystals
2015 StandoutNobel
Atomic layer deposition of thin hafnium oxide films using a carbon free precursor
2002
Lignocellulosic biomass pyrolysis: A review of product properties and effects of pyrolysis parameters
2016 Standout
Definitive Molecular Level Characterization of Defects in UiO‐66 Crystals
2015 StandoutNobel
Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors
2002
UV photodissociation of C2F5Br, C2F5I, and 1,2-C2F4BrI
1984 StandoutNobel
High dielectric constant oxides
2004 Standout
Composition, atomic transport, and chemical stability of ZrAlxOy ultrathin films deposited on Si(001)
2001
Do All Carbonized Charcoals Have the Same Chemical Structure? 2. A Model of the Chemical Structure of Carbonized Charcoal
2007 Standout
A review of Ga2O3 materials, processing, and devices
2018 Standout
DFT investigation of HfCl 4 decomposition on hydroxylated SiO 2 : first stage of HfO 2 atomic layer deposition
2003
Photodissociation of 1,2-chloroiodoethane at 248 and 266 nm: The enthalpy of formation of CH2ClCH2I
1984 StandoutNobel
New Approaches to Nanofabrication: Molding, Printing, and Other Techniques
2005 Standout
Integrity of hafnium silicate/silicon dioxide ultrathin films on Si
2002
I* (5 2P1/2) quenching by hydrogen halides
1976
Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate dielectrics on Si
2004
The role of graphite surface group chemistry on graphite exfoliation during electrochemical lithium insertion
2003
Deposition of HfO[sub 2] Thin Films in HfI[sub 4]-Based Processes
2002
Effect of solution pH, ionic strength, and temperature on adsorption behavior of reactive dyes on activated carbon
2007 Standout
Picosecond photofragment spectroscopy. IV. Dynamics of consecutive bond breakage in the reaction C2F4I2→C2F4+ 2I
1990 StandoutNobel
Si dangling-bond-type defects at the interface of (100)Si with ultrathin HfO2
2003
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
2001
High temperature stability of Al2O3 dielectrics on Si: Interfacial metal diffusion and mobility degradation
2002
Atomic Layer Deposition of Hafnium Dioxide Films from 1-Methoxy-2-methyl-2-propanolate Complex of Hafnium
2003
Surface oxides on carbon and their analysis: a critical assessment
2002 Standout
Surface modification of inorganic nanoparticles for development of organic–inorganic nanocomposites—A review
2013 Standout
Electric-field strength, polarization dipole, and multi-interface band offset in piezoelectricGa 1 − x In x N / G a N
2000 StandoutNobel
Nitrogen incorporation engineering and electrical properties of high-k gate dielectric (HfO2 and Al2O3) films on Si (100) substrate
2004
Heterostructure infrared photovoltaic detectors
2000
Alkali extraction of archaeological and geological charcoal: evidence for diagenetic degradation and formation of humic acids
2010
An examination of how exposure to humid air can result in changes in the adsorption properties of activated carbons
1988
Outdiffusion of La and Al from amorphous LaAlO3 in direct contact with Si (001)
2005
Transport phenomena in nanofluidics
2008 Standout
Oil Palm Biomass as a Precursor of Activated Carbons: A Review
2013 Standout
Review of the stability of biochar in soils: predictability of O:C molar ratios
2010 Standout
Quantum well photoconductors in infrared detector technology
2003
Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate
2002
Environment of hafnium and silicon in Hf-based dielectric films: An atomistic study by x-ray absorption spectroscopy and x-ray diffraction
2005
Effect of N incorporation on boron penetration from p+ polycrystalline-Si through HfSixOy films
2003
Combined Effect of Nitrogen‐ and Oxygen‐Containing Functional Groups of Microporous Activated Carbon on its Electrochemical Performance in Supercapacitors
2008 Standout
Energy band offsets of dielectrics on InGaZnO4
2017
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Piezoelectric Franz–Keldysh effect in strained GaInN/GaN heterostructures
1999 StandoutNobel
Synthesis of nano-scale TiO2 particles by a nonhydrolytic approachElectronic supplementary information (ESI) available: TG analysis of the precursors; particle size distribution analysis of TiO2 nanocrystals dispersed in toluene; XRD analysis of TiO2 nanocrystals with and without glass substrate background. See http://www.rsc.org/suppdata/jm/b2/b202767d/
2002
Quality variations of poultry litter biochar generated at different pyrolysis temperatures
2011 Standout
Infrared detectors: status and trends
2003 Standout
Chemistry and Properties of Nanocrystals of Different Shapes
2005 Standout
The state of understanding of the lithium-ion-battery graphite solid electrolyte interphase (SEI) and its relationship to formation cycling
2016 Standout
Reaction–diffusion in high-k dielectrics on Si
2003
Defect characterization for epitaxial HgCdTe alloys by electron microscopy
2004
Characterization of activated carbon prepared from a single cultivar of Jordanian Olive stones by chemical and physicochemical techniques
2003 Standout
Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies
2003
Photodissociation of alkyl iodides
1975
Spinodal decomposition in amorphous metal–silicate thin films: Phase diagram analysis and interface effects on kinetics
2002
The restaurant at the end of the random walk: recent developments in the description of anomalous transport by fractional dynamics
2004 Standout
Comparison of the Electrical Properties of High-k Gate Dielectric (HfO2 and Al2O3) Films with Pt or n+-Polycrystalline-Silicon Gate
2004
Modulation spectroscopy of semiconductors: bulk/thin film, microstructures, surfaces/interfaces and devices
1993
Dynamics of nonadiabatic reactions. I. F (2P3/2, 2P1/2)+HBr (DBr)→HF (DF)+Br (2P3/2, 2P1/2)
1981 StandoutNobel
Heterojunction Photovoltaics Using Printed Colloidal Quantum Dots as a Photosensitive Layer
2009 StandoutNobel
Internal photoemission of electrons and holes from (100)Si into HfO2
2002
Electrical properties of HfO2 deposited via atomic layer deposition using Hf(NO3)4 and H2O
2003
Density functional theory study of HfCl4, ZrCl4, and Al(CH3)3 decomposition on hydroxylated SiO2: Initial stage of high-k atomic layer deposition
2003
Crop manuring and intensive land management by Europe’s first farmers
2013 Standout
Titanium Dioxide Nanomaterials: Synthesis, Properties, Modifications, and Applications
2007 Standout
Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water
2004
Radiation Effects in MOS Oxides
2008 Standout
Cage effects and steric hindrance in van der Waals solids, with application to alkyl iodide photolysis in rare gas hosts
1976 StandoutNobel
Some recent developments in the chemical vapour deposition of electroceramic oxides
2003
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water
2004
Some aspects of the surface chemistry of carbon blacks and other carbons
1994 Standout
Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
2004
Modification of the surface chemistry of activated carbons
1999 Standout
Interface reactions in ZrO2 based gate dielectric stacks
2002
Works of M. J. Bevan being referenced
Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high‐k materials in microelectronic devices. A carbon‐free precursor for the synthesis of hafnium dioxide
2000
Boron penetration studies from p+ polycrystalline Si through HfSixOy
2002
Collisional quenching of electronically excited bismuth atoms, Bi(6p3 2D3/2) and Bi(6p3 2D5/2), by time-resolved attenuation of atomic resonance radiation
1976
Kinetic study of electronically excited arsenic atoms As(42D , 42P , by time-resolved attenuation of atomic resonance radiation
1974
Interdiffusion studies for HfSixOy and ZrSixOy on Si
2002
Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide
2000
Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors
2002
Phosphorus and arsenic penetration studies through HfSixOy and HfSixOyNz films
2002
The desorption of chemisorbed oxygen from activated carbons and its relationship to ageing and methyl iodide retention efficiency
1984
Influence of layer thickness on the quality of mercury cadmium telluride epilayers grown by the interdiffused multilayer process
1986
Formation and control of defects during molecular beam epitaxial growth of HgCdTe
1998
Thermally induced Zr incorporation into Si from zirconium silicate thin films
2001
Stability of zirconium silicate films on Si under vacuum and O2 annealing
2001
Key performance-limiting defects in P-on-N HgCdTe LPE heterojunction infrared photodiodes
1996