J.P. Xu

Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances

The ReaxFF reactive force-field: development, applications and future directions

Improved Subthreshold Swing and Gate-Bias Stressing Stability of p-Type $\hbox{Cu}_{2}\hbox{O}$ Thin-Film Transistors Using a $\hbox{HfO}_{2}$ High-$k$ Gate Dielectric Grown on a $\hbox{SiO}_{2}/\hbox{Si}$ Substrate by Pulsed Laser Ablation

Hf-based high-k dielectrics for p-Ge MOS gate stacks

Improved electrical properties of Germanium MOS capacitors with gate dielectric grown in wet-NO ambient

Improved electrical properties of Ge metal-oxide-semiconductor capacitors with high-k HfO2 gate dielectric by using La2O3 interlayer sputtered with/without N2 ambient