Standout Papers

New development of atomic layer deposition: processes, methods and applications 2019 2026 2021 2023 359
  1. New development of atomic layer deposition: processes, methods and applications (2019)
    Peter Ozaveshe Oviroh, Rokhsareh Akbarzadeh et al. Science and Technology of Advanced Materials

Immediate Impact

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Citing Papers

Manifestation on the choice of a suitable combination of MIS for proficient Schottky diodes for optoelectronic applications: A comprehensive review
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2 intermediate papers

Works of Dongqing Pan being referenced

New development of atomic layer deposition: processes, methods and applications
2019 Standout

Author Peers

Author Last Decade Papers Cites
Dongqing Pan 507 421 26 78 16 643
Dumindu P. Siriwardena 335 359 15 104 19 579
Tommi Kääriäinen 400 340 46 71 20 612
Yoshihiko Imanaka 453 467 25 86 24 686
Laurent Henn‐Lecordier 466 388 20 133 19 608
Mehmet Aslan 321 450 48 89 30 653
Devika Choudhury 409 342 32 84 21 529
Stefano Modena 244 566 22 93 23 721
J.Q. Zhang 377 395 24 102 15 665
Ben Meester 432 478 63 58 18 636
Shyam Kanta Sinha 259 302 15 92 27 557

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2026