D. Blachier

Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits

High dielectric constant oxides

Basic mechanisms and modeling of single-event upset in digital microelectronics

Heat and Moisture Resistance of Siloxane-Based Low-Dielectric-Constant Materials

Single-event upset and snapback in silicon-on-insulator devices and integrated circuits

Electrical characterization of low permittivity materials for ULSI inter-metal-insulation

High dielectric constant gate oxides for metal oxide Si transistors

Low dielectric constant materials for microelectronics

Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides

Light emission microscopy for thin oxide reliability analysis

Reliability Characterization of Moisture-Induced Degradation of Low-K Dielectric Behavior for Advanced Interconnects

Light emission microscopy for reliability studies