C. Leroux

Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier dystem

Platinum single-atom and cluster catalysis of the hydrogen evolution reaction

Study of HfO2 films deposited on strained Si1−xGex layers by atomic layer deposition

Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits

High dielectric constant oxides

Basic mechanisms and modeling of single-event upset in digital microelectronics

Atomic Layer Deposition Functionalized Composite SOFC Cathode La_0.6Sr_0.4Fe_0.8Co_0.2O_3-δ -Gd_0.2Ce_0.8O_1.9: Enhanced Long-Term Stability

Atomic Layer Deposition: An Overview

Single-event upset and snapback in silicon-on-insulator devices and integrated circuits

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Threshold voltage instabilities in high-/spl kappa/ gate dielectric stacks

High dielectric constant gate oxides for metal oxide Si transistors

Low dielectric constant materials for microelectronics

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides

Light emission microscopy for thin oxide reliability analysis

Frequency characterization and modeling of interface traps in HfSixOy/HfO2 gate dielectric stack from a capacitance point-of-view

Electrical and physico-chemical characterization of HfO2/SiO2 gate oxide stacks prepared by atomic layer deposition

Light emission microscopy for reliability studies