Citation Impact
Citing Papers
LAMMPS - a flexible simulation tool for particle-based materials modeling at the atomic, meso, and continuum scales
2021 Standout
Ab InitioDesign of High-k La x Y 1 − x AlO 3
2005
Calibration of the X‐Ray Photoelectron Spectroscopy Binding Energy Scale for the Characterization of Heterogeneous Catalysts: Is Everything Really under Control?
2013
Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
2003 Standout
Dynamic emission Stokes shift and liquid-like dielectric solvation of band edge carriers in lead-halide perovskites
2019 StandoutNobel
Highly active oxide photocathode for photoelectrochemical water reduction
2011 Standout
Ab‐initiosimulations of materials using VASP: Density‐functional theory and beyond
2008 Standout
High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals
2012 Standout
Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier dystem
2009 StandoutNobel
Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances
2012 Standout
Platinum single-atom and cluster catalysis of the hydrogen evolution reaction
2016 Standout
Breakdown of the adiabatic Born–Oppenheimer approximation in graphene
2007 StandoutNobel
The ReaxFF reactive force-field: development, applications and future directions
2016 Standout
Ab initio lattice dynamics of Ag()
2002
Generation of white-light from Dy3+ doped Sr2SiO4 phosphor
2013
A critical review of high entropy alloys and related concepts
2016 Standout
Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments
2004
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
2001
Chemistry and band offsets of HfO2 thin films for gate insulators
2003
Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
2001
Applications of high throughput (combinatorial) methodologies to electronic, magnetic, optical, and energy-related materials
2013
High dielectric constant oxides
2004 Standout
Atomic-level structure and structure–property relationship in metallic glasses
2010 Standout
Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers
2003
Atomic Layer Deposition of Dielectrics on Ge and III–V Materials for Ultrahigh Performance Transistors
2009
Composition, atomic transport, and chemical stability of ZrAlxOy ultrathin films deposited on Si(001)
2001
A Quantum Chemical Study of the Atomic Layer Deposition of Al2O3 Using AlCl3 and H2O as Precursors
2004
Correlation of annealing effects on local electronic structure and macroscopic electrical properties for HfO2 deposited by atomic layer deposition
2003
Charge-optimized many-body potential for the hafnium/hafnium oxide system
2010
Thermodynamic considerations in the stability of binary oxides for alternative gate dielectrics in complementary metal–oxide–semiconductors
2004
Atomic layer deposition of hafnium oxide on germanium substrates
2005
Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
2004
DFT investigation of HfCl 4 decomposition on hydroxylated SiO 2 : first stage of HfO 2 atomic layer deposition
2003
Oxygen diffusion in atomic layer deposited ZrO2 and HfO2 thin films on Si (100)
2004
Structural and electrical quality of the high-k dielectric Y2O3 on Si (001): Dependence on growth parameters
2002
Integrity of hafnium silicate/silicon dioxide ultrathin films on Si
2002
Atomic Layer Deposition Functionalized Composite SOFC Cathode La0.6Sr0.4Fe0.8Co0.2O3-δ -Gd0.2Ce0.8O1.9: Enhanced Long-Term Stability
2013 StandoutNobel
Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy
2004
Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water
2004
Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate dielectrics on Si
2004
Fluctuation microscopy: a probe of medium range order
2005
Vacancy and interstitial defects in hafnia
2002
Trapping, self-trapping and the polaron family
2007
Ni2P as a Janus catalyst for water splitting: the oxygen evolution activity of Ni2P nanoparticles
2015 Standout
Electron-phonon interactions from first principles
2017 Standout
Atomic Layer Deposition: An Overview
2009 Standout
Negative thermal expansion
2005
Atomic Layer Deposition of HfO2 Using Alkoxides as Precursors
2004
Effects of precursors on nucleation in atomic layer deposition of HfO2
2004
Soft x-ray photoemission studies of the HfO2/SiO2/Si system
2002
Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
2009
Electrical and Physical Properties of HfO[sub 2] Deposited via ALD Using Hf(OtBu)[sub 4] and Ozone atop Al[sub 2]O[sub 3]
2004
Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor
2003
Ab initiomolecular dynamics of metal surfaces
2004
Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides
2003
Characterization of silicate/Si(001) interfaces
2002
Transport phenomena in nanofluidics
2008 Standout
Suppression of subcutaneous oxidation during the deposition of amorphous lanthanum aluminate on silicon
2004
X-ray photoelectron spectroscopy: Towards reliable binding energy referencing
2019 Standout
Interlayer composition of HfO2∕Si(001) films
2004
Thermal stability of polycrystalline silicon electrodes on ZrO2 gate dielectrics
2002
Electrical Characteristics for Lu[sub 2]O[sub 3] Thin Films Fabricated by E-Beam Deposition Method
2004
Random Deposition as a Growth Mode in Atomic Layer Deposition
2004
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Recent advances in transition metal phosphide nanomaterials: synthesis and applications in hydrogen evolution reaction
2016 Standout
Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model
2003
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor
2004
Chemical interaction between atomic-layer-deposited HfO2 thin films and the Si substrate
2002
Low dielectric constant materials for microelectronics
2003 Standout
Decomposition of interfacial SiO2 during HfO2 deposition
2003
High-k/Ge MOSFETs for future nanoelectronics
2008
Spectroscopic study of chemical phase separation in zirconium silicate alloys
2003
Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics
2009
Analytical TEM characterization of the interfacial layer between ALD HfO2 film and silicon substrate
2004
Interfacial oxide formation and oxygen diffusion in rare earth oxide–silicon epitaxial heterostructures
2002
Ammonia pretreatment for high-κ dielectric growth on silicon
2004
Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon
2002
Nucleation and growth during the atomic layer deposition of W on Al2O3 and Al2O3 on W
2004
Stabilizing Nanostructured Solid Oxide Fuel Cell Cathode with Atomic Layer Deposition
2013 StandoutNobel
Reaction–diffusion in high-k dielectrics on Si
2003
Mechanism and kinetics of thin zirconium and hafnium oxide film growth in an ALD reactor
2003
Compatibility of silicon gates with hafnium-based gate dielectrics
2003
Rare-earth oxide thin films as gate oxides in MOSFET transistors
2003
Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen
2002
Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3
2009
X-ray Photoelectron and Absorption Spectroscopy of Metal-Rich Phosphides M2P and M3P (M = Cr−Ni)
2008
Interface instabilities and electronic properties of ZrO2 on silicon (100)
2004
Spinodal decomposition in amorphous metal–silicate thin films: Phase diagram analysis and interface effects on kinetics
2002
Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition
2005
The restaurant at the end of the random walk: recent developments in the description of anomalous transport by fractional dynamics
2004 Standout
Interface structure and non-stoichiometry in HfO2 dielectrics
2004
Selective desorption of interfacial SiO2
2003
Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon
2003
Metal–Oxide RRAM
2012 Standout
Grazing-incidence small angle x-ray scattering studies of phase separation in hafnium silicate films
2003
Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
2004
Initial growth mechanism of atomic layer deposited TiN
2004
Long persistent phosphors—from fundamentals to applications
2016 Standout
Electrical properties of HfO2 deposited via atomic layer deposition using Hf(NO3)4 and H2O
2003
Island growth as a growth mode in atomic layer deposition: A phenomenological model
2004
Density functional theory study of HfCl4, ZrCl4, and Al(CH3)3 decomposition on hydroxylated SiO2: Initial stage of high-k atomic layer deposition
2003
Characterization of HfO2/Si(0 0 1) interface with high-resolution Rutherford backscattering spectroscopy
2004
Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water
2004
Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides
2004 StandoutNobel
Controlled Assembly and Anomalous Thermal Expansion of Ultrathin Cesium Lead Bromide Nanoplatelets
2023 StandoutNobel
Radical-enhanced atomic layer deposition of Y2O3 via a β-diketonate precursor and O radicals
2005
Some recent developments in the chemical vapour deposition of electroceramic oxides
2003
Crystallization kinetics and microstructure-dependent leakage current behavior of ultrathin HfO2 dielectrics: In situ annealing studies
2004
Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films
2005
Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
2004
Resistance switching for RRAM applications
2011
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure
2002
Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films
2007
Atomic layer deposition of HfO2 thin films and nanolayered HfO2–Al2O3–Nb2O5 dielectrics
2003
Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
2003
Porous Anodic Aluminum Oxide: Anodization and Templated Synthesis of Functional Nanostructures
2014 Standout
Effects of metal substitution in transition-metal phosphides (Ni1−xM′x)2P (M′ = Cr, Fe, Co) studied by X-ray photoelectron and absorption spectroscopy
2009
Works of B. Busch being referenced
Materials Characterization of Alternative Gate Dielectrics
2002
Limitations to depth resolution in ion scattering experiments
2001
Temperature dependent structure of clean Ag(110) studied by medium energy ion scattering
1998
Multi-component high-K gate dielectrics for the silicon industry
2001
Oxygen exchange and transport in thin zirconia films on Si(100)
2000
Suppressed crystallization of Hf-based gate dielectrics by controlled addition of Al2O3 using atomic layer deposition
2002
Thermal expansion and mean-square displacements of the Al(110) surface studied with medium-energy ion scattering
2000
Isotopic labeling studies of interactions of nitric oxide and nitrous oxide with ultrathin oxynitride layers on silicon
2000
High-resolution depth profiling of ultrathin gate oxides using medium-energy ion scattering
2001
Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si–O–H) and thermal oxide (SiO2 or Si–O–N) underlayers
2002
High temperature stability in lanthanum and zirconia-based gate dielectrics
2001
Advances in high κ gate dielectrics for Si and III–V semiconductors
2003
Photoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge
2002
Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition
2003
Oscillatory relaxation of Al(110) reinvestigated by using medium-energy ion scattering
1998
Interface reactions of high-κ Y2O3 gate oxides with Si
2001
Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon
2001
Chemical vapor deposition of HfO2 films on Si(100)
2002