A. Upham

Alternative Plasmonic Materials: Beyond Gold and Silver

Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

Device Requirements for Optical Interconnects to Silicon Chips

Atomic Layer Deposition: An Overview

A 90 nm CMOS 16 Gb/s Transceiver for Optical Interconnects

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

TiN Diffusion Barrier Grown by Atomic Layer Deposition Method for Cu Metallization

Germanium-on-SOI Infrared Detectors for Integrated Photonic Applications

Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition

Low temperature inorganic chemical vapor deposition of Ti–Si–N diffusion barrier liners for gigascale copper interconnect applications

Barrier Properties of Titanium Nitride Films Grown by Low Temperature Chemical Vapor Deposition from Titanium Tetraiodide

A high-speed, high-sensitivity silicon lateral trench photodetector