High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

1.4k indexed citations
published 2012

Countries where authors are citing High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

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This map shows the geographic impact of High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals more than expected).

Fields of papers citing High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

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Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals.

About High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

This paper, published in 2012, received 1.4k indexed citations . Written by Sunkook Kim, Aniruddha Konar, Wan-Sik Hwang, Jong Hak Lee, Jiyoul Lee, Jae-Hyun Yang, Changhoon Jung, Hyoungsub Kim, Ji‐Beom Yoo and Jae‐Young Choi covering the research area of Materials Chemistry and Electrical and Electronic Engineering. It is primarily cited by scholars working on Materials Chemistry (1.3k citations), Electrical and Electronic Engineering (728 citations) and Biomedical Engineering (287 citations). Published in Nature Communications.

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This paper is also available at doi.org/10.1038/ncomms2018.

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