Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping
- Authors
- Li LiuSunmin RyuMichelle TomasikElena StolyarovaNaeyoung Jung
- Journal
- Nano Letters
In The Last Decade
doi.org/10.1021/nl0808684 →Countries where authors are citing Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping
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This network shows the impact of Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping.
About Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping
This paper, published in 2008, received 726 indexed citations . Written by Li Liu, Sunmin Ryu, Michelle Tomasik, Elena Stolyarova, Naeyoung Jung, Mark S. Hybertsen, Michael L. Steigerwald, Louis E. Brus and George W. Flynn covering the research area of Materials Chemistry, Biomedical Engineering and Electrical and Electronic Engineering. It is primarily cited by scholars working on Materials Chemistry (637 citations), Electrical and Electronic Engineering (291 citations) and Biomedical Engineering (274 citations). Published in Nano Letters.
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This paper is also available at doi.org/10.1021/nl0808684.