Oxidation of Polycrystalline Copper Thin Films at Ambient Conditions

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This paper, published in 1950, received 802 indexed citations. Written by Ilia Platzman, R. Brener, Hossam Haick and Rina Tannenbaum covering the research area of Materials Chemistry, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials. It is primarily cited by scholars working on Materials Chemistry (467 citations), Electrical and Electronic Engineering (257 citations) and Renewable Energy, Sustainability and the Environment (233 citations). Published in The Journal of Physical Chemistry C.

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Fields of papers citing Oxidation of Polycrystalline Copper Thin Films at Ambient Conditions

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Physical SciencesHealth SciencesLife SciencesSocial Sciences

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This paper is also available at doi.org/10.1021/jp076981k.

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