Yoshiro Ishii

1.0k total citations · 1 hit paper
19 papers, 876 citations indexed

About

Yoshiro Ishii is a scholar working on Materials Chemistry, Mechanics of Materials and Ceramics and Composites. According to data from OpenAlex, Yoshiro Ishii has authored 19 papers receiving a total of 876 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Materials Chemistry, 10 papers in Mechanics of Materials and 7 papers in Ceramics and Composites. Recurrent topics in Yoshiro Ishii's work include Metal and Thin Film Mechanics (9 papers), Luminescence Properties of Advanced Materials (7 papers) and Glass properties and applications (7 papers). Yoshiro Ishii is often cited by papers focused on Metal and Thin Film Mechanics (9 papers), Luminescence Properties of Advanced Materials (7 papers) and Glass properties and applications (7 papers). Yoshiro Ishii collaborates with scholars based in Japan, Poland and Türkiye. Yoshiro Ishii's co-authors include Kazuo Arai, Hiroshi Namikawa, Ken Kumata, Takashi Handa, Tatsutoku Honda, Hiroshi Ichimura, Takayuki Watanabe, Akira Negishi, Hiroki Tanaka and Mitsuhiro Tanaka and has published in prestigious journals such as SHILAP Revista de lepidopterología, Journal of Applied Physics and Journal of the American Ceramic Society.

In The Last Decade

Yoshiro Ishii

18 papers receiving 830 citations

Hit Papers

Aluminum or phosphorus co-doping effects on the fluoresce... 1986 2026 1999 2012 1986 100 200 300 400
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. Aluminum or phosphorus co-doping effects on the fluorescence and structural properties of neodymium-doped silica glass
    1986 490 citations Kazuo Arai, Hiroshi Namikawa et al. Journal of Applied Physics profile →

Peers

Yoshiro Ishii
J. A. Sampaio Brazil
A.E. Geissberger United States
A. Gheorghiu France
R. Sato Japan
Е. В. Жариков Russia
R. A. Lefever United States
John M. Jewell United States
O. L. Krivanek United States
Nadège Ollier France
Akihiko Nukui Japan
J. A. Sampaio Brazil
Yoshiro Ishii
Citations per year, relative to Yoshiro Ishii Yoshiro Ishii (= 1×) peers J. A. Sampaio

Countries citing papers authored by Yoshiro Ishii

Since Specialization
Citations

This map shows the geographic impact of Yoshiro Ishii's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Yoshiro Ishii with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Yoshiro Ishii more than expected).

Fields of papers citing papers by Yoshiro Ishii

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Yoshiro Ishii. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Yoshiro Ishii. The network helps show where Yoshiro Ishii may publish in the future.

Co-authorship network of co-authors of Yoshiro Ishii

This figure shows the co-authorship network connecting the top 25 collaborators of Yoshiro Ishii. A scholar is included among the top collaborators of Yoshiro Ishii based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Yoshiro Ishii. Yoshiro Ishii is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
Yamada, Taro, et al.. (2023). Production of Methane by Sunlight-Driven Photocatalytic Water Splitting and Carbon Dioxide Methanation as a Means of Artificial Photosynthesis. SHILAP Revista de lepidopterología. 3(5). 352–363. 13 indexed citations
2.
Ichimura, Hiroshi, et al.. (2003). Hardness analysis of duplex coating. Surface and Coatings Technology. 169-170. 735–738. 21 indexed citations
3.
Ishii, Yoshiro, et al.. (2003). Surface Modification by Duplex Process Consisted of Radical Nitriding and PVD. Materials science forum. 426-432. 2611–2616. 3 indexed citations
4.
Watanabe, Takayuki, Atsushi Nezu, Yoshiyuki Abe, Yoshiro Ishii, & Kenji Adachi. (2003). Formation mechanism of electrically conductive nanoparticles by induction thermal plasmas. Thin Solid Films. 435(1-2). 27–32. 33 indexed citations
5.
Ichimura, Hiroshi & Yoshiro Ishii. (2002). Effects of indenter radius on the critical load in scratch testing. Surface and Coatings Technology. 165(1). 1–7. 77 indexed citations
6.
Watanabe, Takayuki, Hajime Itoh, & Yoshiro Ishii. (2001). Preparation of ultrafine particles of silicon base intermetallic compound by arc plasma method. Thin Solid Films. 390(1-2). 44–50. 28 indexed citations
7.
Sakamoto, Yukihiro, Matsufumi TAKAYA, Yoshiro Ishii, & Shigeru Igarashi. (2001). Surface modified tool fabricated by radical nitriding. Surface and Coatings Technology. 142-144. 152–155. 7 indexed citations
8.
Ichimura, Hiroshi & Yoshiro Ishii. (2001). Mechanical properties of arc-evaporated CrN coatings.. Surface and Coatings Technology. 145(1-3). 94–100. 10 indexed citations
9.
Ishii, Yoshiro, et al.. (1992). Active Plasma Species in TiN Film Formation Process by Plasma CVD Method. Journal of the Ceramic Society of Japan. 100(1166). 1184–1191. 4 indexed citations
10.
Ishii, Yoshiro, et al.. (1991). TiN film formation by plasma chemical vapor deposition and its plasma diagnostics. Surface and Coatings Technology. 49(1-3). 279–283. 15 indexed citations
11.
Shibata, Takashi, et al.. (1990). Effect of N<SUB>2</SUB> Flow Rate on TiN Films Formed by DC Plasma CVD. Journal of the Japan Institute of Metals and Materials. 54(10). 1112–1119. 1 indexed citations
12.
Ishii, Yoshiro, Kazuo Arai, Hiroshi Namikawa, et al.. (1987). Preparation of Cerium‐Activated Silica Glasses: Phosphorus and Aluminum Codoping Effects on Absorption and Fluorescence Properties. Journal of the American Ceramic Society. 70(2). 72–77. 67 indexed citations
13.
Arai, Kazuo, Hiroshi Namikawa, Yoshiro Ishii, et al.. (1987). Nature of doping into pure silica glass by plasma torch CVD. Journal of Non-Crystalline Solids. 95-96. 609–616. 30 indexed citations
14.
Arai, Kazuo, Hiroshi Namikawa, Ken Kumata, et al.. (1986). Aluminum or phosphorus co-doping effects on the fluorescence and structural properties of neodymium-doped silica glass. Journal of Applied Physics. 59(10). 3430–3436. 490 indexed citations breakdown →
15.
Ishii, Yoshiro, Hiroshi Namikawa, Kazuo Arai, et al.. (1985). Preparation of Nd-Al Co-doped SiO<sub>2</sub> Glass by Plasma Torch CVD and Its Fluorescence Properties. Journal of the Ceramic Association Japan. 93(1081). 498–504. 7 indexed citations
16.
Namikawa, Hiroshi, et al.. (1984). Preparation of Nd-Doped SiO2Glasses by Axial Injection Plasma Torch CVD and Their Fluorescence Properties. Japanese Journal of Applied Physics. 23(6A). L409–L409. 6 indexed citations
17.
Arai, Kazuo, et al.. (1983). Fluorescence and its Nd3+ Concentration Dependence of Nd-Doped SiO2 Glasses Prepared by Plasma Torch CVD. Japanese Journal of Applied Physics. 22(7A). L397–L397. 26 indexed citations
18.
Namikawa, Hiroshi, Kazuo Arai, Ken Kumata, Yoshiro Ishii, & Hiroki Tanaka. (1982). Preparation of Nd-Doped SiO2 Glass by Plasma Torch CVD. Japanese Journal of Applied Physics. 21(6A). L360–L360. 33 indexed citations
19.
Sakai, Shizuyoshi, et al.. (1967). Synthesis of Ethylene Glycol Mono-Oleate from Ethylene Oxide and Oleic Acid. The Journal of the Society of Chemical Industry Japan. 70(2). 169–172. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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