S. S. Dana

449 total citations
12 papers, 367 citations indexed

About

S. S. Dana is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, S. S. Dana has authored 12 papers receiving a total of 367 indexed citations (citations by other indexed papers that have themselves been cited), including 7 papers in Electrical and Electronic Engineering, 5 papers in Materials Chemistry and 2 papers in Mechanics of Materials. Recurrent topics in S. S. Dana's work include Thin-Film Transistor Technologies (3 papers), Advancements in Photolithography Techniques (3 papers) and Semiconductor materials and devices (3 papers). S. S. Dana is often cited by papers focused on Thin-Film Transistor Technologies (3 papers), Advancements in Photolithography Techniques (3 papers) and Semiconductor materials and devices (3 papers). S. S. Dana collaborates with scholars based in United States, Denmark and Israel. S. S. Dana's co-authors include Konstantin Etzold, Ralph Schaetzing, D. Davidov, J. D. Litster, M. L. Kaplan, Cyrus R. Safinya, R. J. Birgeneau, José R. Maldonado, M. Liehr and J. Als‐Nielsen and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

S. S. Dana

12 papers receiving 351 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
S. S. Dana United States 9 199 179 93 67 64 12 367
D Stoenescu France 10 314 1.6× 119 0.7× 77 0.8× 156 2.3× 55 0.9× 42 465
А. Г. Терещенко Ukraine 10 391 2.0× 155 0.9× 65 0.7× 190 2.8× 82 1.3× 33 516
E. A. Konshina Russia 12 370 1.9× 182 1.0× 84 0.9× 202 3.0× 100 1.6× 83 472
L. Trossi Italy 11 181 0.9× 54 0.3× 49 0.5× 130 1.9× 83 1.3× 28 332
G. J. Sprokel United States 11 202 1.0× 59 0.3× 179 1.9× 213 3.2× 97 1.5× 18 365
Hiroyuki Shiraki Japan 13 240 1.2× 118 0.7× 323 3.5× 196 2.9× 108 1.7× 39 534
Robert D. Polak United States 7 268 1.3× 53 0.3× 79 0.8× 150 2.2× 38 0.6× 16 335
Uttam Manna United States 14 243 1.2× 175 1.0× 193 2.1× 175 2.6× 185 2.9× 31 495
Hajimu Sonomura Japan 14 155 0.8× 282 1.6× 361 3.9× 269 4.0× 43 0.7× 42 551
Ken-ichi Muta Japan 11 81 0.4× 314 1.8× 326 3.5× 201 3.0× 58 0.9× 26 659

Countries citing papers authored by S. S. Dana

Since Specialization
Citations

This map shows the geographic impact of S. S. Dana's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. S. Dana with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. S. Dana more than expected).

Fields of papers citing papers by S. S. Dana

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. S. Dana. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. S. Dana. The network helps show where S. S. Dana may publish in the future.

Co-authorship network of co-authors of S. S. Dana

This figure shows the co-authorship network connecting the top 25 collaborators of S. S. Dana. A scholar is included among the top collaborators of S. S. Dana based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. S. Dana. S. S. Dana is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

12 of 12 papers shown
1.
Dana, S. S., M. Anderle, Gary W. Rubloff, & A. Acovic. (1993). Chemical vapor deposition of rough-morphology silicon films over a broad temperature range. Applied Physics Letters. 63(10). 1387–1389. 4 indexed citations
2.
Liehr, M., S. S. Dana, & M. Anderle. (1992). Nucleation and growth of silicon on SiO2 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 10(4). 869–873. 10 indexed citations
3.
Dana, S. S., M. Liehr, M. Anderle, & Gary W. Rubloff. (1992). Kinetics of nucleation and growth of Si on SiO2 in very low pressure SiH4 chemical vapor deposition. Applied Physics Letters. 61(25). 3035–3037. 14 indexed citations
4.
Dana, S. S., et al.. (1991). Crystallization of sol-gel derived lead zirconate titanate thin films. Journal of Applied Physics. 69(8). 4398–4403. 75 indexed citations
5.
Dana, S. S.. (1991). The Properties of Low Pressure Chemical Vapor Deposited Boron Nitride Thin Films. Materials science forum. 54-55. 229–260. 20 indexed citations
6.
Uzoh, Cyprian, et al.. (1988). Mechanical characterization of membranes for x-ray lithography masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2178–2183. 8 indexed citations
7.
Dana, S. S., et al.. (1987). Use of Scanning Electron Microscopy and Energy Dispersive X-Ray Analysis (SEM-EDXA) in Identification of Foreign Material on Bullets. Journal of Forensic Sciences. 32(1). 38–47. 17 indexed citations
8.
Dana, S. S., et al.. (1987). Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates. Microelectronic Engineering. 6(1-4). 233–240. 2 indexed citations
9.
Dana, S. S. & José R. Maldonado. (1986). Low pressure chemical vapor deposition boro-hydro-nitride films and their use in x-ray masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 4(1). 235–239. 16 indexed citations
10.
Efremow, N. N., et al.. (1981). A simple technique for modifying the profile of resist exposed by holographic lithography. Journal of Vacuum Science and Technology. 19(4). 1234–1237. 13 indexed citations
11.
Davidov, D., Cyrus R. Safinya, M. L. Kaplan, et al.. (1979). High-resolution x-ray and light-scattering study of critical behavior associated with the nematic—smectic-Atransition in 4-cyano-4′-octylbiphenyl. Physical review. B, Condensed matter. 19(3). 1657–1663. 121 indexed citations
12.
Litster, J. D., J. Als‐Nielsen, R. J. Birgeneau, et al.. (1979). HIGH RESOLUTION X-RAY AND LIGHT SCATTERING STUDIES OF BILAYER SMECTIC A COMPOUNDS. Le Journal de Physique Colloques. 40(C3). C3–339. 67 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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