P.H. Key

1.3k total citations
33 papers, 1.0k citations indexed

About

P.H. Key is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, P.H. Key has authored 33 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 17 papers in Materials Chemistry and 15 papers in Mechanics of Materials. Recurrent topics in P.H. Key's work include Laser-induced spectroscopy and plasma (14 papers), Diamond and Carbon-based Materials Research (14 papers) and Laser Material Processing Techniques (13 papers). P.H. Key is often cited by papers focused on Laser-induced spectroscopy and plasma (14 papers), Diamond and Carbon-based Materials Research (14 papers) and Laser Material Processing Techniques (13 papers). P.H. Key collaborates with scholars based in United Kingdom and Czechia. P.H. Key's co-authors include P. E. Dyer, James E. Andrew, Daniel J. Förster, R.D. Greenough, S. R. Farrar, David Sands, Paul Monk, Marc Schmidt, H.V. Snelling and L Li and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

P.H. Key

32 papers receiving 963 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
P.H. Key United Kingdom 15 508 478 434 283 185 33 1.0k
D. B�uerle Austria 19 270 0.5× 428 0.9× 424 1.0× 284 1.0× 131 0.7× 41 900
C. Boulmer-Leborgne France 20 996 2.0× 450 0.9× 543 1.3× 325 1.1× 241 1.3× 53 1.4k
M. Vitiello Italy 16 635 1.3× 558 1.2× 353 0.8× 92 0.3× 207 1.1× 24 998
John J. Adams United States 16 171 0.3× 328 0.7× 323 0.7× 395 1.4× 196 1.1× 41 923
J. Perrière France 19 274 0.5× 233 0.5× 671 1.5× 528 1.9× 150 0.8× 52 1.0k
Takuro Tomita Japan 17 198 0.4× 435 0.9× 368 0.8× 290 1.0× 160 0.9× 80 961
S. Papernov United States 16 253 0.5× 531 1.1× 192 0.4× 276 1.0× 152 0.8× 68 855
J. C. Loulergue France 16 233 0.5× 174 0.4× 294 0.7× 417 1.5× 439 2.4× 49 899
Kouichi Murakami Japan 20 267 0.5× 373 0.8× 751 1.7× 652 2.3× 335 1.8× 95 1.3k
A. Qayyum Pakistan 16 235 0.5× 549 1.1× 309 0.7× 239 0.8× 157 0.8× 83 1.1k

Countries citing papers authored by P.H. Key

Since Specialization
Citations

This map shows the geographic impact of P.H. Key's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by P.H. Key with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites P.H. Key more than expected).

Fields of papers citing papers by P.H. Key

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by P.H. Key. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by P.H. Key. The network helps show where P.H. Key may publish in the future.

Co-authorship network of co-authors of P.H. Key

This figure shows the co-authorship network connecting the top 25 collaborators of P.H. Key. A scholar is included among the top collaborators of P.H. Key based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with P.H. Key. P.H. Key is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Gilbert, James M., et al.. (2003). Via and embedded resistor production in low cost lithographically printed substrates. Brunel University Research Archive (BURA) (Brunel University London). 160–166. 2 indexed citations
2.
Sands, David, et al.. (2000). Optical Characterization of Lattice Damage and Recovery in Ion-Implanted and Pulsed Excimer Laser Irradiated 4H-SiC. Materials science forum. 338-342. 655–658. 4 indexed citations
3.
Sands, David, et al.. (2000). Optical characterisation of pulsed laser deposited SiC films. Applied Surface Science. 154-155. 83–88. 9 indexed citations
4.
Clarke, Philip A., P. E. Dyer, P.H. Key, & H.V. Snelling. (1999). Plasma ignition thresholds in UV laser ablation plumes. Applied Physics A. 69(S1). S117–S120. 15 indexed citations
5.
Sands, David, et al.. (1999). Evidence for a thermal mechanism in excimer laser ablation of thin film ZnS on Si. Journal of Applied Physics. 85(7). 3855–3859. 4 indexed citations
6.
Schmidt, Marc, et al.. (1999). A comparative study of the effects of laser wavelength on laser removal of chlorinated rubber. Applied Surface Science. 138-139. 418–423. 23 indexed citations
7.
Dyer, P. E., J. Gonzalo, P.H. Key, David Sands, & Marc Schmidt. (1997). Studies of target materials and wavelength for laser ablation-deposition of Ti:sapphire. Applied Surface Science. 109-110. 345–349. 11 indexed citations
8.
Sands, David, G. V. M. Williams, & P.H. Key. (1997). Excimer laser recrystallization of amorphous silicon investigated by normal incidence spectral reflectivity. Semiconductor Science and Technology. 12(6). 750–754. 4 indexed citations
9.
Dyer, P. E., et al.. (1996). Excimer laser ablation and film deposition of Ti:sapphire. Applied Surface Science. 96-98. 849–854. 16 indexed citations
10.
Dyer, P. E., Dimitris Karnakis, P.H. Key, & Paul Monk. (1996). Excimer laser ablation for micro-machining: geometric effects. Applied Surface Science. 96-98. 415–419. 9 indexed citations
11.
Key, P.H., et al.. (1995). Photo-luminescence of pulsed excimer laser annealed Sb-implanted CdTe. Applied Surface Science. 86(1-4). 364–367. 4 indexed citations
12.
Dyer, P. E., et al.. (1995). Blast-wave studies of excimer laser ablation of ZnS. Applied Surface Science. 86(1-4). 18–23. 16 indexed citations
13.
Key, P.H., et al.. (1994). UV-Excimer Laser Ablation Patterning of II-VI Compound Semiconductors. Materials science forum. 173-174. 59–66. 2 indexed citations
14.
Dyer, P. E., et al.. (1993). Magnetic field enhanced excitation and ionization in excimer laser-ablation plumes. AIP conference proceedings. 288. 349–358. 3 indexed citations
15.
Dyer, P. E., et al.. (1993). Laser ablation studies of magnesium oxide. Applied Surface Science. 69(1-4). 216–220. 23 indexed citations
16.
Dyer, P. E., S. R. Farrar, & P.H. Key. (1992). Investigation of excimer laser ablation of ceramic and thin film Y-Ba-Cu-O using nanosecond photoacoustic techniques. Applied Physics Letters. 60(15). 1890–1892. 19 indexed citations
17.
Dyer, P. E., S. R. Farrar, & P.H. Key. (1992). Fast time-response photoacoustic studies and modelling of KrF laser ablated YBa2Cu3O7. Applied Surface Science. 54. 255–263. 26 indexed citations
18.
Dyer, P. E., et al.. (1990). A CW CO2laser substrate heater for superconducting thin-film deposition. Superconductor Science and Technology. 3(9). 472–475. 21 indexed citations
19.
Dyer, P. E., et al.. (1990). An investigation of laser ablation and deposition of Y-Ba-Cu-O in an oxygen environment. Applied Surface Science. 46(1-4). 89–95. 56 indexed citations
20.
Key, P.H., et al.. (1989). Excimer Laser Machining Of Aerospace Materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1132. 111–111. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026