Mathias Tomandl

543 total citations · 1 hit paper
9 papers, 328 citations indexed

About

Mathias Tomandl is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Surfaces, Coatings and Films. According to data from OpenAlex, Mathias Tomandl has authored 9 papers receiving a total of 328 indexed citations (citations by other indexed papers that have themselves been cited), including 5 papers in Electrical and Electronic Engineering, 3 papers in Atomic and Molecular Physics, and Optics and 3 papers in Surfaces, Coatings and Films. Recurrent topics in Mathias Tomandl's work include Advancements in Photolithography Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Electron and X-Ray Spectroscopy Techniques (3 papers). Mathias Tomandl is often cited by papers focused on Advancements in Photolithography Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Electron and X-Ray Spectroscopy Techniques (3 papers). Mathias Tomandl collaborates with scholars based in Austria, South Korea and Switzerland. Mathias Tomandl's co-authors include Markus Arndt, William B. Case, Sarayut Deachapunya, Paul J. Fagan, Stefan Gerlich, Sandra Eibenberger, Jens Tüxen, Marcel Mayor, Klaus Hornberger and Stefan Nimmrichter and has published in prestigious journals such as Nature Communications, Scientific Reports and Optics Express.

In The Last Decade

Mathias Tomandl

8 papers receiving 304 citations

Hit Papers

Quantum interference of large organic molecules 2011 2026 2016 2021 2011 50 100 150 200

Peers

Mathias Tomandl
Victoria Borish United States
Yanhua Shih United States
Megan Agnew United Kingdom
Mayukh Lahiri United States
Mathias Tomandl
Citations per year, relative to Mathias Tomandl Mathias Tomandl (= 1×) peers Sarayut Deachapunya

Countries citing papers authored by Mathias Tomandl

Since Specialization
Citations

This map shows the geographic impact of Mathias Tomandl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mathias Tomandl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mathias Tomandl more than expected).

Fields of papers citing papers by Mathias Tomandl

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mathias Tomandl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mathias Tomandl. The network helps show where Mathias Tomandl may publish in the future.

Co-authorship network of co-authors of Mathias Tomandl

This figure shows the co-authorship network connecting the top 25 collaborators of Mathias Tomandl. A scholar is included among the top collaborators of Mathias Tomandl based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mathias Tomandl. Mathias Tomandl is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

9 of 9 papers shown
1.
Tomandl, Mathias, Christoph Spengler, P. Hudek, et al.. (2024). Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography. Journal of Micro/Nanopatterning Materials and Metrology. 23(1). 2 indexed citations
2.
Kim, Hyo-Yeon, Won Sik Shin, Kangho Park, et al.. (2024). Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer. 11–11. 1 indexed citations
3.
Tomandl, Mathias, Christoph Spengler, Christof Klein, Hans Loeschner, & Elmar Platzgummer. (2023). Multi-beam mask writing opens up new fields of application. 7637. 45–45. 1 indexed citations
4.
Kim, Sun Young, et al.. (2023). New multi-beam mask data preparation method for EUV high volume data. 7379. 8–8. 1 indexed citations
5.
Tomandl, Mathias, Christof Klein, Hans Loeschner, & Elmar Platzgummer. (2023). MBMW-100 flex, the 1st electron multi-beam mask writer for mature and advanced mask nodes. 30–30. 1 indexed citations
6.
Tomandl, Mathias, et al.. (2015). Simulated Interactive Research Experiments as Educational Tools for Advanced Science. Scientific Reports. 5(1). 14108–14108. 7 indexed citations
7.
Gerlich, Stefan, Sandra Eibenberger, Mathias Tomandl, et al.. (2011). Quantum interference of large organic molecules. Nature Communications. 2(1). 263–263. 206 indexed citations breakdown →
8.
Tomandl, Mathias. (2010). Realisierung von optischen Talbot- und Talbot-Lau-Teppichen. University of Vienna.
9.
Case, William B., Mathias Tomandl, Sarayut Deachapunya, & Markus Arndt. (2009). Realization of optical carpets in the Talbot and Talbot-Lau configurations. Optics Express. 17(23). 20966–20966. 109 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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