Masafumi Asano

535 citations
54 papers · 366 indexed · h-index 11
Topics
Advancements in Photolithography Techniques (31 papers)Nanofabrication and Lithography Techniques (16 papers)Optical Coatings and Gratings (11 papers)

In The Last Decade

Masafumi Asano

52 papers receiving 338 citations

Peers

Masafumi Asano
Comparison fields: 5 of 53
  • Electrical and Electronic Engineering 226
  • Biomedical Engineering 78
  • Surfaces, Coatings and Films 54
  • Computer Networks and Communications 43
  • Materials Chemistry 41
Replace Charles D. Schaper with:
Charles D. Schaper United States
Jiang Taiwan
Andreas Fuchs Germany
Tim Fühner Germany
Jason P. Cain United States
Gaopeng Xue China
Ju-Yi Lee Taiwan
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Hongwei Xu China
Masafumi Asano relative to Charles D. Schaper United States Charles D. Schaper's profile →
Citations per field
00.5×
Charles D. Schaper · 1×
Citations per year

Countries citing papers authored by Masafumi Asano

Since Specialization
Citations

This map shows the geographic impact of Masafumi Asano's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Masafumi Asano with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Masafumi Asano more than expected).

Fields of papers citing papers by Masafumi Asano

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Masafumi Asano. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Masafumi Asano. The network helps show where Masafumi Asano may publish in the future.

Co-authorship network of co-authors of Masafumi Asano

This figure shows the co-authorship network connecting the top 25 collaborators of Masafumi Asano. A scholar is included among the top collaborators of Masafumi Asano based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Masafumi Asano. Masafumi Asano is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1 11
2 2
3 2
4 15
5 7
6 3
7 3
8 4
9 2
10 2
11 0
12 2
13 2
14 6
15 3
16 4
17 1
18 23
19 3
20 20

About Masafumi Asano

Masafumi Asano is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Statistics, Probability and Uncertainty, having authored 54 papers that have together received 366 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Nanofabrication and Lithography Techniques (16 papers) and Optical Coatings and Gratings (11 papers). The work is most often cited by research in Surfaces, Coatings and Films (54 citations), Electrical and Electronic Engineering (226 citations) and Metals and Alloys (9 citations). Masafumi Asano has collaborated with scholars based in Japan, United States and South Korea. Frequent co-authors include F. Masuoka, S. Tanaka, Shin‐ichi Tanaka, Soichi Inoue, Kaoru Suzuki, Fumihiko Hoshino, Osamu Hori, Takahiro Ikeda, Shun Suzuki and Mitsuru Kikuchi. Their work appears in journals such as Journal of Applied Physics, IEEE Journal of Solid-State Circuits and Computer.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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