Masafumi Asano

535 total citations
54 papers, 366 citations indexed

About

Masafumi Asano is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Masafumi Asano has authored 54 papers receiving a total of 366 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 23 papers in Biomedical Engineering and 12 papers in Surfaces, Coatings and Films. Recurrent topics in Masafumi Asano's work include Advancements in Photolithography Techniques (31 papers), Nanofabrication and Lithography Techniques (16 papers) and Optical Coatings and Gratings (11 papers). Masafumi Asano is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Nanofabrication and Lithography Techniques (16 papers) and Optical Coatings and Gratings (11 papers). Masafumi Asano collaborates with scholars based in Japan, United States and South Korea. Masafumi Asano's co-authors include F. Masuoka, S. Tanaka, Osamu Hori, Kaoru Suzuki, Fumihiko Hoshino, Soichi Inoue, Shin‐ichi Tanaka, Ranbir Singh, Takahiro Ikeda and Mitsuru Kikuchi and has published in prestigious journals such as Journal of Applied Physics, IEEE Journal of Solid-State Circuits and Computer.

In The Last Decade

Masafumi Asano

52 papers receiving 338 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Masafumi Asano Japan 11 226 78 54 43 41 54 366
Yu-Cheng Yang Taiwan 8 192 0.8× 106 1.4× 59 1.1× 76 1.8× 43 1.0× 21 367
Jason P. Cain United States 10 432 1.9× 64 0.8× 81 1.5× 31 0.7× 17 0.4× 36 492
Charles D. Schaper United States 10 181 0.8× 171 2.2× 32 0.6× 14 0.3× 35 0.9× 31 355
Junhao Zhu China 12 133 0.6× 61 0.8× 33 0.6× 30 0.7× 121 3.0× 37 367
Andreas Fuchs Germany 11 272 1.2× 179 2.3× 81 1.5× 44 1.0× 10 0.2× 35 414
Junxian Ma China 13 210 0.9× 178 2.3× 31 0.6× 28 0.7× 13 0.3× 29 547
Sung-Ho Lee South Korea 8 99 0.4× 43 0.6× 40 0.7× 11 0.3× 35 0.9× 44 317
Yuelin Du United States 17 552 2.4× 145 1.9× 35 0.6× 22 0.5× 94 2.3× 36 588
Z. G. Li Singapore 9 123 0.5× 113 1.4× 8 0.1× 20 0.5× 51 1.2× 21 309
Dongwan Kim South Korea 10 196 0.9× 42 0.5× 38 0.7× 78 1.8× 12 0.3× 63 331

Countries citing papers authored by Masafumi Asano

Since Specialization
Citations

This map shows the geographic impact of Masafumi Asano's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Masafumi Asano with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Masafumi Asano more than expected).

Fields of papers citing papers by Masafumi Asano

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Masafumi Asano. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Masafumi Asano. The network helps show where Masafumi Asano may publish in the future.

Co-authorship network of co-authors of Masafumi Asano

This figure shows the co-authorship network connecting the top 25 collaborators of Masafumi Asano. A scholar is included among the top collaborators of Masafumi Asano based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Masafumi Asano. Masafumi Asano is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Takayama, Shigeki, Takashi Yazawa, Masafumi Asano, et al.. (2022). Design and Magnetic Field Measurement of the Superconducting Magnets for the Next-Generation Rotating Gantry. IEEE Transactions on Applied Superconductivity. 32(6). 1–4. 11 indexed citations
2.
Asano, Masafumi, et al.. (2017). Required metrology and inspection for nanoimprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101450J–101450J. 2 indexed citations
3.
Sendelbach, Matthew, et al.. (2017). Application of advanced hybrid metrology method to nanoimprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101451X–101451X. 2 indexed citations
4.
Asano, Masafumi, et al.. (2017). Metrology and inspection required for next generation lithography. Japanese Journal of Applied Physics. 56(6S1). 06GA01–06GA01. 15 indexed citations
5.
Asano, Masafumi, et al.. (2013). Application of optical CD metrology for alternative lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8681. 86812C–86812C. 7 indexed citations
6.
Nagahara, Seiji, et al.. (2007). Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 652008–652008. 3 indexed citations
7.
Asano, Masafumi, et al.. (2006). In-line CD metrology with combined use of scatterometry and CD-SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 61521V–61521V. 3 indexed citations
8.
Asano, Masafumi, et al.. (2005). Sampling plan optimization for CD control in low k 1 lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 727–727. 4 indexed citations
9.
Koike, Toru, et al.. (2005). Usage of profile information obtained with scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 736–736. 2 indexed citations
10.
Asano, Masafumi. (2003). Effective exposure-dose monitor technique for critical dimension control in optical lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 2(2). 129–129. 2 indexed citations
11.
Inoue, Soichi, et al.. (2002). Desirable reticle flatness from focus deviation standpoint optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 530–530.
12.
Asano, Masafumi, et al.. (2000). Highly Accurate and Precise Measurement Technique for Effective Exposure Dose. Japanese Journal of Applied Physics. 39(12S). 6796–6796. 2 indexed citations
13.
Asano, Masafumi, et al.. (2000). Novel methodology for 130-nm DRAM cell mask size optimization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4066. 47–47. 2 indexed citations
14.
Sato, Y., S Miyoshi, Masafumi Asano, et al.. (1999). Novel antireflective layer using polysilane for deep ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3398–3401. 6 indexed citations
15.
Asano, Masafumi, et al.. (1998). Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 869–869. 3 indexed citations
16.
Satō, Kazuo, et al.. (1996). Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2724. 70–70. 4 indexed citations
17.
Asano, Masafumi, et al.. (1995). Dynamics of a semiflexible polymer poly(n‐hexyl isocyanate) in isotropic solution. 2. Dielectric dispersion. Journal of Rheology. 39(4). 800–800. 1 indexed citations
18.
Hori, Osamu, et al.. (1992). A robust recognition system for a drawing superimposed on a map. Computer. 25(7). 56–59. 23 indexed citations
19.
Ikeda, Kiyohiro, et al.. (1987). A 130K-gate mainframe chip set. 86–87. 3 indexed citations
20.
Masuoka, F., et al.. (1985). A 256K flash EEPROM using triple polysilicon technology. 168–169. 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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