J.P. Fillard
- Materials Chemistry top 2%
-
- Gas Sensing Nanomaterials and Sensors 12
- Silicon and Solar Cell Technologies 10
- Semiconductor materials and devices 10
- Integrated Circuits and Semiconductor Failure Analysis 8
- Advanced Semiconductor Detectors and Materials 7
- Polymers and Plastics top 5%
- Surfaces, Coatings and Films top 5%
- Ceramics and Composites top 5%
-
- Semiconductor Quantum Structures and Devices 11
- Semiconductor materials and interfaces 9
-
- Near-Field Optical Microscopy 8
- Co-authors
- J.-C. ManifacierJ. GasiotM. de MurciaE. VicarioM. CastagnéJ. BonnaféP. BräunlichG. Delacôte
- Journals
- Journal of Applied Physics (9 papers)Journal of Crystal Growth (4 papers)Electronics Letters (4 papers)
- Partner nations
- FranceUnited StatesGermany
In The Last Decade
J.P. Fillard
72 papers receiving 2.5k citations
Hit Papers
Peers
Comparison fields: 5 of 70
- Materials Chemistry 1.8k
- Electrical and Electronic Engineering 1.8k
- Polymers and Plastics 354
- Surfaces, Coatings and Films 173
- Ceramics and Composites 136
Countries citing papers authored by J.P. Fillard
This map shows the geographic impact of J.P. Fillard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J.P. Fillard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J.P. Fillard more than expected).
Fields of papers citing papers by J.P. Fillard
This network shows the impact of papers produced by J.P. Fillard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J.P. Fillard. The network helps show where J.P. Fillard may publish in the future.
Co-authorship network
The 25 scholars most cited alongside J.P. Fillard, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1995 | 10 | |
| 2 | 1995 | 7 | |
| 3 | 1994 | 4 | |
| 4 | 1992 | 17 | |
| 5 | 1990 | 12 | |
| 6 | 1990 | 6 | |
| 7 | 1989 | 1 | |
| 8 | 1988 | 3 | |
| 9 | 1986 | 4 | |
| 10 | 1985 | 9 | |
| 11 | 1984 | 14 | |
| 12 | 1982 | 23 | |
| 13 | 1980 | 19 | |
| 14 | Thermally stimulated processes in solids : new prospects : proceedings of the international workshop on thermally stimulated processes in solids, Montpellier, June 22-25, 1976 | 1977 | 8 |
| 15 | 1977 | 2 | |
| 16 | 1977 | 11 | |
| 17 | A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin filmbreakdown → | 1976 | 1449 |
| 18 | 1972 | 14 | |
| 19 | 1971 | 2 | |
| 20 | 1970 | 1 |
About J.P. Fillard
J.P. Fillard is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Bioengineering and Polymers and Plastics, having authored 73 papers that have together received 2.6k indexed citations. Recurring topics across this work include Gas Sensing Nanomaterials and Sensors (12 papers), Semiconductor Quantum Structures and Devices (11 papers), Silicon and Solar Cell Technologies (10 papers), Semiconductor materials and devices (10 papers), Semiconductor materials and interfaces (9 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Near-Field Optical Microscopy (8 papers) and Advanced Semiconductor Detectors and Materials (7 papers). The work is most often cited by research in Materials Chemistry (1.8k citations), Electrical and Electronic Engineering (1.8k citations), Polymers and Plastics (354 citations), Surfaces, Coatings and Films (173 citations) and Ceramics and Composites (136 citations). J.P. Fillard has collaborated with scholars based in France, United States and Germany. Frequent co-authors include J.-C. Manifacier, J. Gasiot, M. de Murcia, E. Vicario, M. Castagné, J. Bonnafé, P. Bräunlich, G. Delacôte, Paul Montgomery and Pierre Parot. Their work appears in journals such as Journal of Applied Physics, Journal of Crystal Growth, Electronics Letters, Journal of Electrostatics and Solid State Communications.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.