HoKwon Kim

4.2k citations
27 papers · 3.1k indexed · 2 hit papers · h-index 15

HoKwon Kim

26 papers receiving 3.1k citations

Hit Papers

A review of chemical vapour deposition of graphene on copper1.2k20092026201420202505007501000

Peers

HoKwon Kim
Comparison fields: 5 of 74
  • Materials Chemistry 2.7k
  • Electrical and Electronic Engineering 1.4k
  • Biomedical Engineering 1.0k
  • Electronic, Optical and Magnetic Materials 419
  • Polymers and Plastics 175
Replace Da Luo with:
Da Luo China
Sarah Brittman United States
Antony George Germany
Sang Hoon Chae South Korea
Jonas Röhrl Germany
Luzhao Sun China
Xianlong Wei China
Tianru Wu China
Guibai Xie China
A‐Rang Jang South Korea
HoKwon Kim relative to Da Luo China Da Luo's profile →
Citations per field
00.5×1.5×2.0×
Da Luo · 1×
Citations per year

Countries citing papers authored by HoKwon Kim

Since Specialization
Citations

This map shows the geographic impact of HoKwon Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by HoKwon Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites HoKwon Kim more than expected).

Fields of papers citing papers by HoKwon Kim

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by HoKwon Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by HoKwon Kim. The network helps show where HoKwon Kim may publish in the future.

Co-authorship network

The 25 scholars most cited alongside HoKwon Kim, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with HoKwon Kim Line = papers co-authored together HoKwon Kim links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20260
2 20233
3 20214
4 20204
5 2019129
6 201866
7 201832
8 20172
9 2017188
10 201610
11 20153
12 201439
13 201343
14 201314
15 201344
16 201234
17 2012369
18 2010187
19
A review of chemical vapour deposition of graphene on copperbreakdown →
20101169
20
Insulator to Semimetal Transition in Graphene Oxidebreakdown →
2009565

About HoKwon Kim

HoKwon Kim is a scholar working on Materials Chemistry, Electrical and Electronic Engineering and Media Technology, having authored 27 papers that have together received 3.1k indexed citations. Recurring topics across this work include Graphene research and applications (14 papers), 2D Materials and Applications (10 papers), Advanced Memory and Neural Computing (4 papers), MXene and MAX Phase Materials (3 papers), Thin-Film Transistor Technologies (3 papers), Perovskite Materials and Applications (3 papers), Organic Light-Emitting Diodes Research (3 papers) and Thermal properties of materials (2 papers). The work is most often cited by research in Materials Chemistry (2.7k citations), Electrical and Electronic Engineering (1.4k citations) and Biomedical Engineering (1.0k citations). HoKwon Kim has collaborated with scholars based in United States, France and United Kingdom. Frequent co-authors include Cecilia Mattevi, Manish Chhowalla, Goki Eda, Hisato Yamaguchi, András Kis, Eduardo Saiz, Dmitry Ovchinnikov, Cyrus F. Hirjibehedin, Luca Artiglia and M. Reyes Calvo. Their work appears in journals such as ACS Nano, Nano Letters, Ultramicroscopy, Applied Physics Letters and Physical Review B.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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