Hideshi Nomura

455 total citations
17 papers, 365 citations indexed

About

Hideshi Nomura is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Hideshi Nomura has authored 17 papers receiving a total of 365 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 7 papers in Materials Chemistry and 4 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Hideshi Nomura's work include Synthesis and properties of polymers (4 papers), Plasma Diagnostics and Applications (4 papers) and Silicone and Siloxane Chemistry (4 papers). Hideshi Nomura is often cited by papers focused on Synthesis and properties of polymers (4 papers), Plasma Diagnostics and Applications (4 papers) and Silicone and Siloxane Chemistry (4 papers). Hideshi Nomura collaborates with scholars based in Japan and United States. Hideshi Nomura's co-authors include Joji Ando, Akira Kamiya, Toshio Goto, Sachio Suzuki, Akihiro Kono, K. Akimoto, A. Kono, Takao Tanaka, Masaru Hori and Mineo Hiramatsu and has published in prestigious journals such as Journal of Applied Physics, Journal of Physics D Applied Physics and Japanese Journal of Applied Physics.

In The Last Decade

Hideshi Nomura

17 papers receiving 353 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Hideshi Nomura Japan 11 127 84 71 58 50 17 365
P King United Kingdom 15 222 1.7× 161 1.9× 264 3.7× 69 1.2× 46 0.9× 28 807
Mari Yoshikawa Japan 9 135 1.1× 206 2.5× 129 1.8× 63 1.1× 66 1.3× 16 549
Masayoshi Tarutani Japan 13 216 1.7× 160 1.9× 70 1.0× 22 0.4× 21 0.4× 33 454
P. L. Jones United States 13 149 1.2× 164 2.0× 47 0.7× 51 0.9× 32 0.6× 44 536
Hiroaki Endo Japan 14 66 0.5× 39 0.5× 44 0.6× 62 1.1× 34 0.7× 46 493
Shota Suzuki Japan 12 98 0.8× 114 1.4× 43 0.6× 32 0.6× 20 0.4× 46 394
K. Watanabe Japan 14 123 1.0× 182 2.2× 79 1.1× 131 2.3× 74 1.5× 53 573
Pablo Andrés García Argentina 11 89 0.7× 49 0.6× 61 0.9× 21 0.4× 17 0.3× 27 346
Dezhang Zhu China 18 182 1.4× 488 5.8× 106 1.5× 71 1.2× 58 1.2× 52 800
Akihisa Yamamoto Japan 15 35 0.3× 80 1.0× 135 1.9× 33 0.6× 13 0.3× 42 481

Countries citing papers authored by Hideshi Nomura

Since Specialization
Citations

This map shows the geographic impact of Hideshi Nomura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hideshi Nomura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hideshi Nomura more than expected).

Fields of papers citing papers by Hideshi Nomura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hideshi Nomura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hideshi Nomura. The network helps show where Hideshi Nomura may publish in the future.

Co-authorship network of co-authors of Hideshi Nomura

This figure shows the co-authorship network connecting the top 25 collaborators of Hideshi Nomura. A scholar is included among the top collaborators of Hideshi Nomura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hideshi Nomura. Hideshi Nomura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
1.
Nomura, Hideshi & Kazuharu Shimizu. (2010). Stress in Tin-Doped Indium Oxide Thin Films Formed on Substrates by Sputtering. Japanese Journal of Applied Physics. 49(2R). 25501–25501. 5 indexed citations
2.
Nomura, Hideshi, et al.. (1996). Effect of Thermal Curing on Molecular Orientation in Polyimide Films Having Rodlike Molecular Skeleton Formed on Substrates. Japanese Journal of Applied Physics. 35(11R). 5825–5825. 9 indexed citations
3.
Nomura, Hideshi, Akihiro Kono, & Toshio Goto. (1996). Dilution-Gas Effect on Electron Density and Temperature in RF SiH 4 Plasma Based on Microwave Cavity Resonance Measurement. Japanese Journal of Applied Physics. 35(6R). 3603–3603. 3 indexed citations
4.
Nomura, Hideshi, et al.. (1995). Effect of Thermal Curing on Thermomechanical Properties of Polyimide Films Having Rodlike Molecular Skeleton Formed on a Silicon Substrate. Japanese Journal of Applied Physics. 34(11R). 6143–6143. 6 indexed citations
5.
Nomura, Hideshi, K. Akimoto, A. Kono, & Toshio Goto. (1995). Rate constants for the reactions of SiH and SiH2with SiH4in a low-pressure SiH4plasma. Journal of Physics D Applied Physics. 28(9). 1977–1982. 27 indexed citations
6.
Kono, Akihiro, et al.. (1995). Laser-Induced-Fluorescence Study of the SiH2 Density in RF SiH4 Plasmas with Xe, Ar, He, and H2 Dilution Gases. Japanese Journal of Applied Physics. 34(1R). 307–307. 27 indexed citations
7.
Nomura, Hideshi, Akihiro Kono, & Toshio Goto. (1994). Effect of Dilution Gases on the SiH3Radical Density in an RF SiH4Plasma. Japanese Journal of Applied Physics. 33(7S). 4165–4165. 16 indexed citations
8.
Yamamoto, Yasuo, Hideshi Nomura, Takao Tanaka, et al.. (1994). Measurement of Absolute Densities of Si, SiH and SiH3in Electron Cyclotron Resonance SiH4/H2Plasma. Japanese Journal of Applied Physics. 33(7S). 4320–4320. 32 indexed citations
9.
Nomura, Hideshi, et al.. (1993). Molecular Orientation in Polyimide Films Having Rodlike Molecular Skeleton Formed on Silicon Substrate. Japanese Journal of Applied Physics. 32(9R). 3933–3933. 13 indexed citations
10.
Nomura, Hideshi, et al.. (1992). Measurement of CH3 Radical in RF Methane/Rare Gas Plasma Using Infrared Diode Laser Absorption Spectroscopy.. The Review of Laser Engineering. 20(9). 746–751. 13 indexed citations
11.
Nomura, Hideshi, et al.. (1991). Stress in polyimide films having a rodlike molecular skeleton formed on a silicon substrate. Journal of Applied Physics. 70(11). 7085–7088. 11 indexed citations
12.
Nomura, Hideshi, et al.. (1991). Interfacial Interaction between Nematic Liquid Crystal and Polymer in the Composite Film Consisting of Nematic Liquid Crystal and Connected Polymer Microspheres. Japanese Journal of Applied Physics. 30(2R). 327–327. 13 indexed citations
13.
Nomura, Hideshi, et al.. (1990). Electrooptical Properties of Polymer Films Containing Nematic Liquid Crystal Microdroplets. Japanese Journal of Applied Physics. 29(3R). 522–522. 21 indexed citations
14.
Nomura, Hideshi, et al.. (1990). Electro-optical properties of films consisting of nematic liquid crystals and connected polymer microspheres. Journal of Applied Physics. 68(6). 2922–2926. 9 indexed citations
15.
Nomura, Hideshi, et al.. (1988). A disk-type apparatus for applying fluid shear stress on cultured endothelial cell. Biorheology. 25(3). 461–470. 23 indexed citations
16.
Ando, Joji, Hideshi Nomura, & Akira Kamiya. (1987). The effect of fluid shear stress on the migration and proliferation of cultured endothelial cells. Microvascular Research. 33(1). 62–70. 133 indexed citations
17.
Nomura, Hideshi, et al.. (1979). The migration of lymphocytes across the vascular endothelium in lymph nodes: a scanning electron microscopic study.. PubMed. 12(1). 9–10. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026