H. Windischmann

3.0k total citations · 1 hit paper
40 papers, 2.4k citations indexed

About

H. Windischmann is a scholar working on Materials Chemistry, Mechanics of Materials and Electrical and Electronic Engineering. According to data from OpenAlex, H. Windischmann has authored 40 papers receiving a total of 2.4k indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Materials Chemistry, 20 papers in Mechanics of Materials and 20 papers in Electrical and Electronic Engineering. Recurrent topics in H. Windischmann's work include Diamond and Carbon-based Materials Research (19 papers), Metal and Thin Film Mechanics (17 papers) and Ion-surface interactions and analysis (10 papers). H. Windischmann is often cited by papers focused on Diamond and Carbon-based Materials Research (19 papers), Metal and Thin Film Mechanics (17 papers) and Ion-surface interactions and analysis (10 papers). H. Windischmann collaborates with scholars based in United States, United Kingdom and France. H. Windischmann's co-authors include Peter Mark, Glenn F. Epps, R. W. Collins, Yue Cong, J. E. Butler, J. González‐Hernández, J. C. Rife, Ajay P. Malshe, A. H. Clark and W.P. Kang and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

H. Windischmann

39 papers receiving 2.3k citations

Hit Papers

Intrinsic stress in sputter-deposited thin films 1992 2026 2003 2014 1992 100 200 300 400 500
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. Intrinsic stress in sputter-deposited thin films
    1992 535 citations H. Windischmann profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
H. Windischmann United States 19 1.6k 1.3k 1.1k 508 358 40 2.4k
R. P. Netterfield Australia 27 1.2k 0.8× 1.1k 0.9× 1.0k 0.9× 294 0.6× 644 1.8× 74 2.3k
N. Savvides Australia 33 2.6k 1.7× 1.4k 1.1× 1.2k 1.1× 467 0.9× 359 1.0× 135 4.1k
S. Orlando Italy 26 1.3k 0.8× 767 0.6× 553 0.5× 517 1.0× 677 1.9× 145 2.2k
Toyonobu Yoshida Japan 28 1.4k 0.9× 914 0.7× 754 0.7× 160 0.3× 239 0.7× 101 2.2k
G.A. Scarsbrook United Kingdom 21 2.1k 1.3× 790 0.6× 986 0.9× 257 0.5× 295 0.8× 32 2.3k
V. G. Ralchenko Russia 24 1.4k 0.9× 580 0.4× 461 0.4× 317 0.6× 308 0.9× 82 1.7k
Naoji Fujimori Japan 29 2.6k 1.7× 1.4k 1.1× 947 0.9× 647 1.3× 250 0.7× 70 2.9k
Alan F. Jankowski United States 21 1.3k 0.9× 670 0.5× 583 0.5× 258 0.5× 169 0.5× 107 2.0k
K. V. Ravi United States 23 1.5k 1.0× 598 0.5× 1.1k 1.0× 224 0.4× 162 0.5× 66 2.1k
V. Peřina Czechia 25 1.2k 0.8× 888 0.7× 794 0.7× 159 0.3× 207 0.6× 131 1.9k

Countries citing papers authored by H. Windischmann

Since Specialization
Citations

This map shows the geographic impact of H. Windischmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Windischmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Windischmann more than expected).

Fields of papers citing papers by H. Windischmann

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Windischmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Windischmann. The network helps show where H. Windischmann may publish in the future.

Co-authorship network of co-authors of H. Windischmann

This figure shows the co-authorship network connecting the top 25 collaborators of H. Windischmann. A scholar is included among the top collaborators of H. Windischmann based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. Windischmann. H. Windischmann is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Jamison, K. D., et al.. (2003). Gated carbon-based cold cathode for high current applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(4). 1738–1741. 2 indexed citations
2.
Windischmann, H., et al.. (2003). Thermal modeling of diamond-based power electronics packaging. 98–104. 66 indexed citations
3.
Windischmann, H., et al.. (1999). Thermal Management Enhancement for GaAs Devices Using CVD Diamond Heat Spreaders in a Plastic Package Environment. Journal of Electronic Packaging. 122(2). 92–97. 7 indexed citations
4.
Butler, J. E. & H. Windischmann. (1998). Developments in CVD-Diamond Synthesis During the Past Decade. MRS Bulletin. 23(9). 22–27. 83 indexed citations
5.
Olson, James M., et al.. (1995). Measurement of Stress In CVD Diamond Films. MRS Proceedings. 383. 9 indexed citations
6.
Windischmann, H.. (1992). Intrinsic Stress in Sputter Deposited Thin Films. Optical Interference Coatings. OFA2–OFA2. 2 indexed citations
7.
Cong, Yue, R. W. Collins, R. Messier, et al.. (1991). Spectroscopic ellipsometry study of the optical properties of thin film diamond and diamond surfaces in real time during ion beam etching. 735–740.
8.
Kubiak, Glenn D., et al.. (1991). Resist Characterization at Soft X-Ray Wavelengths. ThD3–ThD3. 1 indexed citations
9.
Cong, Yue, R. W. Collins, R. Messier, et al.. (1991). Characterization of ion beam-induced surface modification of diamond films by real time spectroscopic ellipsometry. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 9(3). 1123–1128. 18 indexed citations
10.
Windischmann, H., Glenn F. Epps, Yue Cong, & R. W. Collins. (1991). Intrinsic stress in diamond films prepared by microwave plasma CVD. Journal of Applied Physics. 69(4). 2231–2237. 230 indexed citations
11.
Maluf, N.I., R. F. W. Pease, & H. Windischmann. (1990). Distortion measurement of embedded absorber (silicon membrane) and conventional (diamond membrane) x-ray masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1584–1588. 4 indexed citations
12.
Windischmann, H.. (1989). Temperature dependence of intrinsic stress in Fe, Si, and AlN prepared by ion beam sputtering. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 7(3). 2247–2251. 17 indexed citations
13.
Windischmann, H.. (1987). An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering. Journal of Applied Physics. 62(5). 1800–1807. 328 indexed citations
14.
Windischmann, H.. (1987). Intrinsic stress in A1N prepared by dual-ion-beam sputtering. Thin Solid Films. 154(1-2). 159–170. 52 indexed citations
15.
Windischmann, H., et al.. (1986). Effect of hydrogen on the intrinsic stress in ion beam sputtered amorphous silicon films. Journal of Non-Crystalline Solids. 85(3). 261–272. 32 indexed citations
16.
Collins, R. W., et al.. (1985). A study of the microstructure of a-Si:H using spectroscopic ellipsometry measurements. Thin Solid Films. 129(1-2). 127–138. 22 indexed citations
17.
Collins, R. W., et al.. (1985). Optical properties of dense thin-film Si and Ge prepared by ion-beam sputtering. Journal of Applied Physics. 58(2). 954–957. 67 indexed citations
18.
Collins, R. W., Ce Huang, & H. Windischmann. (1985). Oxidation and etching of hydrogenated amorphous silicon; An in situ ellipsometry study. Solar Energy Materials. 12(4). 289–298. 1 indexed citations
19.
Windischmann, H., et al.. (1983). A novel bilevel resist system. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(4). 1241–1246. 2 indexed citations
20.
Windischmann, H., et al.. (1981). X‐Ray Lithography Mask Technology. Journal of The Electrochemical Society. 128(5). 1116–1120. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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