H. Anderson

1.8k total citations
45 papers, 894 citations indexed

About

H. Anderson is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, H. Anderson has authored 45 papers receiving a total of 894 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 17 papers in Mechanics of Materials and 11 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in H. Anderson's work include Plasma Diagnostics and Applications (21 papers), Laser-induced spectroscopy and plasma (9 papers) and Semiconductor materials and devices (9 papers). H. Anderson is often cited by papers focused on Plasma Diagnostics and Applications (21 papers), Laser-induced spectroscopy and plasma (9 papers) and Semiconductor materials and devices (9 papers). H. Anderson collaborates with scholars based in United States, United Kingdom and Germany. H. Anderson's co-authors include G. S. Oehrlein, Ling Li, Xuefeng Hua, Rahul Jairath, Xi Li, Li Xi, Paul Miller, Svetlana Radovanov, R. Hoekstra and H. P. Summers and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Review of Scientific Instruments.

In The Last Decade

H. Anderson

43 papers receiving 829 citations

Peers

H. Anderson
P. Kudrna Czechia
D. C. Schram Netherlands
D. C. Schram Netherlands
C. C. Chu United States
A. Iwamae Japan
H. Anderson
Citations per year, relative to H. Anderson H. Anderson (= 1×) peers K. Muraoka

Countries citing papers authored by H. Anderson

Since Specialization
Citations

This map shows the geographic impact of H. Anderson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Anderson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Anderson more than expected).

Fields of papers citing papers by H. Anderson

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Anderson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Anderson. The network helps show where H. Anderson may publish in the future.

Co-authorship network of co-authors of H. Anderson

This figure shows the co-authorship network connecting the top 25 collaborators of H. Anderson. A scholar is included among the top collaborators of H. Anderson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. Anderson. H. Anderson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Adli, E., et al.. (2025). Development of a nonlinear plasma lens for achromatic beam transport. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 1072. 170223–170223. 1 indexed citations
2.
Elliott, Mark A., et al.. (2025). Using a volitional help sheet to increase university students' attendance at on‐campus lectures: A randomized controlled trial. British Journal of Educational Psychology. 96(1). 270–285.
3.
Xi, Li, Ling Li, Xuefeng Hua, et al.. (2003). Characteristics of C4F8 plasmas with Ar, Ne, and He additives for SiO2 etching in an inductively coupled plasma (ICP) reactor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 21(6). 1955–1963. 30 indexed citations
4.
Xi, Li, Ling Li, Xuefeng Hua, et al.. (2002). Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 21(1). 284–293. 80 indexed citations
5.
Anderson, H.. (2002). Plasma diagnostics for semiconductor processing. II17–II18. 5 indexed citations
6.
Anderson, H., et al.. (2001). Plasma Etch Endpoint and Fault Detection Along with UV-Vis Absorption Spectroscopy from a Single Compact Solid State Detector.. 2 indexed citations
7.
Falter, H., H. Anderson, H. P. Summers, et al.. (2001). Development of Fast Helium Beam Emission Spectroscopy for Plasma Density and Temperature Diagnostics. MPG.PuRe (Max Planck Society). 1 indexed citations
8.
Schaepkens, M., et al.. (2001). Gas-phase studies in inductively coupled fluorocarbon plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 19(6). 2946–2957. 21 indexed citations
9.
Anderson, H., R. Hoekstra, L.D. Horton, et al.. (2000). Neutral beam stopping and emission in fusion plasmas I: deuterium beams. Plasma Physics and Controlled Fusion. 42(7). 781–806. 67 indexed citations
10.
Summers, H. P., H. Anderson, Mathias Brix, et al.. (1999). Electron and neutral interactions with impurities in divertor plasmas. Plasma Physics Reports. 25(1). 15–27. 1 indexed citations
11.
Summers, H. P., H. Anderson, N. R. Badnell, et al.. (1998). The use of atomic and molecular data in fusion plasma diagnostics. AIP conference proceedings. 259–286. 1 indexed citations
12.
Anderson, H. & Svetlana Radovanov. (1995). Dusty Plasma Studies in the Gaseous Electronics Conference Reference Cell. Journal of Research of the National Institute of Standards and Technology. 100(4). 449–449. 14 indexed citations
13.
Miller, Paul, et al.. (1992). Electrical isolation of RF plasma discharges. Bulletin of the American Physical Society. 37(9). 1 indexed citations
14.
Miller, Paul, et al.. (1992). Electrical isolation of radio-frequency plasma discharges. Journal of Applied Physics. 71(3). 1171–1176. 46 indexed citations
15.
Anderson, H.. (1992). The 44th Annual Gaseous Electronics Conference. 22–25. 1 indexed citations
16.
Anderson, H., et al.. (1990). Particulate generation in silane/ammonia rf discharges. Journal of Applied Physics. 67(9). 3999–4011. 55 indexed citations
17.
Anderson, H., et al.. (1988). Reactive Ion Etching of Aluminum/Silicon in BBr3 / Cl2 and BCl3 / Cl2 Mixtures. Journal of The Electrochemical Society. 135(5). 1184–1191. 9 indexed citations
18.
Ooij, W.J. van, H. Anderson, & GUNNAR STRÖM. (1988). Mechanism of Corrosion Propagation in Precoated Automotive Steels. 1–18. 2 indexed citations
19.
Anderson, H., et al.. (1984). Nonlinear Concentration Effects on Radionuclide Diffusion and Mobility in Compacted Bentonite.. MRS Proceedings. 44. 1 indexed citations
20.
Hieftje, Gary M., et al.. (1982). Design and Construction of a Low-Flow, Low-Power Torch for Inductively Coupled Plasma Spectrometry. Applied Spectroscopy. 36(6). 627–631. 71 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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