Fei Fan
-
- Metamaterials and Metasurfaces Applications 128
- Aerospace Engineering top 0.5%
- Advanced Antenna and Metasurface Technologies 45
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- Terahertz technology and applications 122
- Photonic and Optical Devices 55
- Millimeter-Wave Propagation and Modeling 18
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- Photonic Crystals and Applications 48
- Orbital Angular Momentum in Optics 16
- Biomedical Engineering top 2%
- Plasmonic and Surface Plasmon Research 67
- Cited by
- Electronic, Optical and Magnetic MaterialsAerospace EngineeringElectrical and Electronic Engineering
- Partner nations
- ChinaUnited StatesHong Kong
In The Last Decade
Fei Fan
226 papers receiving 4.4k citations
Hit Papers
Peers
Comparison fields: 5 of 90
- Electronic, Optical and Magnetic Materials 2.8k
- Aerospace Engineering 1.2k
- Electrical and Electronic Engineering 2.5k
- Atomic and Molecular Physics, and Optics 1.3k
- Biomedical Engineering 1.3k
Countries citing papers authored by Fei Fan
This map shows the geographic impact of Fei Fan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Fei Fan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Fei Fan more than expected).
Fields of papers citing papers by Fei Fan
This network shows the impact of papers produced by Fei Fan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Fei Fan. The network helps show where Fei Fan may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Fei Fan, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 10 | |
| 2 | 2025 | 0 | |
| 3 | 2025 | 2 | |
| 4 | 2025 | 4 | |
| 5 | 2024 | 8 | |
| 6 | 2024 | 12 | |
| 7 | 2024 | 15 | |
| 8 | 2024 | 10 | |
| 9 | 2024 | 0 | |
| 10 | 2024 | 5 | |
| 11 | 2023 | 4 | |
| 12 | 2023 | 64 | |
| 13 | 2023 | 8 | |
| 14 | 2023 | 42 | |
| 15 | 2023 | 0 | |
| 16 | 2022 | 40 | |
| 17 | 2022 | 78 | |
| 18 | 2021 | 34 | |
| 19 | 2019 | 45 | |
| 20 | 2018 | 108 |
About Fei Fan
Fei Fan is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, having authored 243 papers that have together received 4.6k indexed citations. Recurring topics across this work include Metamaterials and Metasurfaces Applications (128 papers), Terahertz technology and applications (122 papers), Plasmonic and Surface Plasmon Research (67 papers), Photonic and Optical Devices (55 papers), Photonic Crystals and Applications (48 papers), Advanced Antenna and Metasurface Technologies (45 papers), Millimeter-Wave Propagation and Modeling (18 papers) and Orbital Angular Momentum in Optics (16 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (2.8k citations), Aerospace Engineering (1.2k citations) and Electrical and Electronic Engineering (2.5k citations). Fei Fan has collaborated with scholars based in China, United States and Hong Kong. Frequent co-authors include Shengjiang Chang, Xianghui Wang, Sai Chen, Yunyun Ji, Shi‐Tong Xu, Jierong Cheng, Yi Huang, Zhiyu Tan, Meng Chen and Wenle Ma. Their work appears in journals such as Optics Express, Optics Communications, Optics Letters, Applied Optics and Photonics Research.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.