Do-Joong Lee

513 total citations
22 papers, 442 citations indexed

About

Do-Joong Lee is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Do-Joong Lee has authored 22 papers receiving a total of 442 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 15 papers in Materials Chemistry and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Do-Joong Lee's work include Semiconductor materials and devices (10 papers), Graphene research and applications (9 papers) and Copper Interconnects and Reliability (4 papers). Do-Joong Lee is often cited by papers focused on Semiconductor materials and devices (10 papers), Graphene research and applications (9 papers) and Copper Interconnects and Reliability (4 papers). Do-Joong Lee collaborates with scholars based in South Korea, United States and Pakistan. Do-Joong Lee's co-authors include Ki‐Bum Kim, Soo‐Hyun Kim, Min‐Hyun Lee, Tae‐Sik Yoon, Hyun-Mi Kim, Ki-Su Kim, Seong‐Yong Cho, Sung‐Wook Nam, Seunghyun Lee and S. M. Rossnagel and has published in prestigious journals such as Nano Letters, Journal of Applied Physics and ACS Applied Materials & Interfaces.

In The Last Decade

Do-Joong Lee

22 papers receiving 432 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Do-Joong Lee South Korea 12 302 240 106 93 47 22 442
Trevor A. Petach United States 9 208 0.7× 232 1.0× 97 0.9× 109 1.2× 35 0.7× 11 422
Virginia R. Anderson United States 13 372 1.2× 312 1.3× 51 0.5× 87 0.9× 34 0.7× 18 486
Jianan Deng China 15 345 1.1× 407 1.7× 171 1.6× 178 1.9× 74 1.6× 50 647
Marco Sturaro Italy 11 305 1.0× 250 1.0× 153 1.4× 88 0.9× 23 0.5× 16 465
Hainan Zhang China 11 379 1.3× 343 1.4× 84 0.8× 131 1.4× 25 0.5× 26 526
F. Chaabouni Tunisia 14 432 1.4× 500 2.1× 87 0.8× 124 1.3× 65 1.4× 30 597
Ken Ha Koh South Korea 15 276 0.9× 511 2.1× 146 1.4× 67 0.7× 23 0.5× 56 647
T. P. Leervad Pedersen Germany 12 378 1.3× 433 1.8× 100 0.9× 104 1.1× 33 0.7× 16 552
Fuwen Qin China 16 471 1.6× 297 1.2× 59 0.6× 210 2.3× 31 0.7× 72 701
Hanbyeol Jang South Korea 12 308 1.0× 457 1.9× 113 1.1× 81 0.9× 35 0.7× 21 597

Countries citing papers authored by Do-Joong Lee

Since Specialization
Citations

This map shows the geographic impact of Do-Joong Lee's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Do-Joong Lee with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Do-Joong Lee more than expected).

Fields of papers citing papers by Do-Joong Lee

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Do-Joong Lee. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Do-Joong Lee. The network helps show where Do-Joong Lee may publish in the future.

Co-authorship network of co-authors of Do-Joong Lee

This figure shows the co-authorship network connecting the top 25 collaborators of Do-Joong Lee. A scholar is included among the top collaborators of Do-Joong Lee based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Do-Joong Lee. Do-Joong Lee is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kim, Minsu, Min‐Sik Kim, Sang‐Bong Lee, et al.. (2020). Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application. ACS Applied Materials & Interfaces. 12(12). 14331–14340. 28 indexed citations
2.
Kim, Jin Ho, Do-Joong Lee, Elizabeth S. Hirst, et al.. (2020). Facile chemical tuning of thermoelectric power factor of graphene oxide. Materials Chemistry and Physics. 254. 123488–123488. 2 indexed citations
3.
Lee, Sang‐Bong, Minsu Kim, Seong‐Yong Cho, et al.. (2019). Electrical properties of graphene/In2O3 bilayer with remarkable uniformity as transparent conducting electrode. Nanotechnology. 31(9). 95708–95708. 9 indexed citations
4.
Lee, Do-Joong, et al.. (2019). A microstructuring route to enhanced thermoelectric efficiency of reduced graphene oxide films. Materials Research Express. 6(7). 75614–75614. 6 indexed citations
5.
Fernandes, Gustavo E., et al.. (2018). A lightweight scalable agarose-gel-synthesized thermoelectric composite. Materials Research Express. 5(3). 35031–35031. 1 indexed citations
6.
Osgood, Richard M., Alexander M. Stolyarov, Richard P. Kingsborough, et al.. (2018). Fiber-based chemical sensing and sensing platforms with colorimetric dyes. 7673. 50–50. 2 indexed citations
7.
Lee, Seung‐Joon, et al.. (2016). Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 34(3). 18 indexed citations
8.
Lee, Hyunjung, Won Seok Han, Do-Joong Lee, et al.. (2016). A controlled growth of WNx and WCx thin films prepared by atomic layer deposition. Materials Letters. 168. 218–222. 30 indexed citations
9.
Kim, Soo‐Hyun, et al.. (2016). Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 34(4). 9 indexed citations
10.
Cho, Seong‐Yong, Min‐Sik Kim, Minsu Kim, et al.. (2015). Self-assembly and continuous growth of hexagonal graphene flakes on liquid Cu. Nanoscale. 7(30). 12820–12827. 32 indexed citations
11.
Hong, Tae Eun, Bo Keun Park, Taek‐Mo Chung, et al.. (2015). Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu. Journal of Alloys and Compounds. 663. 651–658. 38 indexed citations
12.
Yeo, Seungmin, Jiyoon Park, Seung‐Joon Lee, et al.. (2015). Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen. Microelectronic Engineering. 137. 16–22. 30 indexed citations
13.
Hong, Tae Eun, Seungmin Yeo, Taehoon Cheon, et al.. (2014). Highly Conformal Amorphous W–Si–N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization. The Journal of Physical Chemistry C. 119(3). 1548–1556. 19 indexed citations
14.
Cho, Seong‐Yong, et al.. (2013). Gas transport controlled synthesis of graphene by employing a micro-meter scale gap jig. RSC Advances. 3(48). 26376–26376. 4 indexed citations
15.
Cho, Seong‐Yong, Hyun-Mi Kim, Min‐Hyun Lee, Do-Joong Lee, & Ki‐Bum Kim. (2012). Single-step formation of a graphene–metal hybrid transparent and electrically conductive film. Nanotechnology. 23(11). 115301–115301. 8 indexed citations
16.
Hu, Quanli, Young Jin Choi, Chi Jung Kang, et al.. (2012). Resistive switching characteristics of maghemite nanoparticle assembly on Al and Pt electrodes on a flexible substrate. Journal of Physics D Applied Physics. 45(22). 225304–225304. 17 indexed citations
17.
Fernandes, Gustavo E., et al.. (2012). Infrared and microwave shielding of transparent Al-doped ZnO superlattice grown via atomic layer deposition. Journal of Materials Science. 48(6). 2536–2542. 31 indexed citations
18.
Cho, Seong‐Yong, Hyun-Mi Kim, Min‐Hyun Lee, Do-Joong Lee, & Ki‐Bum Kim. (2012). Direct formation of graphene layers on top of SiC during the carburization of Si substrate. Current Applied Physics. 12(4). 1088–1091. 6 indexed citations
19.
Lee, Do-Joong, et al.. (2011). Controlling spatial density and size of nanocrystals by two-step atomic layer deposition. Nanotechnology. 22(9). 95305–95305. 2 indexed citations
20.
Lee, Do-Joong, et al.. (2008). Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition. Journal of Applied Physics. 103(11). 68 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026