D. S. Alles

518 total citations
16 papers, 317 citations indexed

About

D. S. Alles is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Mechanical Engineering. According to data from OpenAlex, D. S. Alles has authored 16 papers receiving a total of 317 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 6 papers in Surfaces, Coatings and Films and 2 papers in Mechanical Engineering. Recurrent topics in D. S. Alles's work include Advancements in Photolithography Techniques (11 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). D. S. Alles is often cited by papers focused on Advancements in Photolithography Techniques (11 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). D. S. Alles collaborates with scholars based in United States and Japan. D. S. Alles's co-authors include R.J. Collier, D. R. Herriott, John W. Stafford, A. M. Johnson, George Smith, H. J. Levinstein, M.P. Lepselter, William A. Schlegel, J. G. Skinner and Jason Stafford and has published in prestigious journals such as Proceedings of the IEEE, IEEE Transactions on Electron Devices and Bell System Technical Journal.

In The Last Decade

D. S. Alles

15 papers receiving 267 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
D. S. Alles United States	7	163	117	93	81	44	16	317
R. Hamilton Shepard United States	5	218 1.3×	30 0.3×	93 1.0×	95 1.2×	45 1.0×	13	312
J.G. Linvill United States	8	155 1.0×	311 2.7×	84 0.9×	99 1.2×	29 0.7×	18	581
Michal Karol Dobrzynski Switzerland	6	63 0.4×	131 1.1×	34 0.4×	208 2.6×	51 1.2×	8	371
Keisuke Hasegawa Japan	12	232 1.4×	71 0.6×	174 1.9×	113 1.4×	100 2.3×	51	480
Hyung-Sik Kim South Korea	10	107 0.7×	78 0.7×	16 0.2×	85 1.0×	29 0.7×	60	405
Yitian Shao United States	9	223 1.4×	21 0.2×	88 0.9×	118 1.5×	78 1.8×	24	327
Taku Nakamura Japan	7	100 0.6×	45 0.4×	57 0.6×	83 1.0×	94 2.1×	13	348
Nicholas Wettels United States	10	379 2.3×	37 0.3×	54 0.6×	495 6.1×	67 1.5×	15	635
Jae-Hoon Choi South Korea	9	101 0.6×	139 1.2×	24 0.3×	173 2.1×	12 0.3×	23	336
Xiong Zhang China	13	244 1.5×	167 1.4×	30 0.3×	166 2.0×	5 0.1×	36	501

Countries citing papers authored by D. S. Alles

Since Specialization

Citations

This map shows the geographic impact of D. S. Alles's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. S. Alles with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. S. Alles more than expected).

Fields of papers citing papers by D. S. Alles

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. S. Alles. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. S. Alles. The network helps show where D. S. Alles may publish in the future.

Co-authorship network of co-authors of D. S. Alles

This figure shows the co-authorship network connecting the top 25 collaborators of D. S. Alles. A scholar is included among the top collaborators of D. S. Alles based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. S. Alles. D. S. Alles is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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16 of 16 papers shown

Alles, D. S., et al.. (2010). Results from a new 193nm die-to-database reticle inspection platform. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7748. 774828–774828. 2 indexed citations

Alles, D. S., et al.. (2005). Measuring line-edge roughness of masks with DUV light. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5992. 59924P–59924P. 2 indexed citations

Alles, D. S., et al.. (2004). Results from a new die-to-database reticle inspection platform. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5446. 265–265. 2 indexed citations

Alles, D. S., et al.. (2003). Results from a new reticle defect inspection platform. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5256. 474–474. 6 indexed citations

Alles, D. S.. (2002). Trends in laser packaging. 185–192. 20 indexed citations

Alles, D. S., et al.. (2000). Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-μm technology node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4066. 462–462.

Alles, D. S., et al.. (1989). Packaging Technology for III-V Photonic Devices and Integrated Circuits. AT&T Technical Journal. 68(1). 83–92. 5 indexed citations

Alles, D. S., John H. Bruning, J.T. Clemens, et al.. (1987). EBES4: A new electron-beam exposure system. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 5(1). 47–52. 6 indexed citations

Bruning, John H., et al.. (1987). A hydraulic X–Y stage system for application in electron beam exposure systems. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 5(1). 57–60. 1 indexed citations

10.

Lepselter, M.P., et al.. (1983). A systems approach to 1-µm NMOS. Proceedings of the IEEE. 71(5). 640–656. 12 indexed citations

11.

Alles, D. S., et al.. (1975). A second generation Ebes. 21. 1–1. 1 indexed citations

12.

Herriott, D. R., R.J. Collier, D. S. Alles, & John W. Stafford. (1975). EBES: A practical electron lithographic system. IEEE Transactions on Electron Devices. 22(7). 385–392. 67 indexed citations

13.

Alles, D. S., et al.. (1975). Control system design and alignment methods for electron lithography. Journal of Vacuum Science and Technology. 12(6). 1252–1256. 9 indexed citations

14.

Herriott, D. R., R.J. Collier, D. S. Alles, & Jason Stafford. (1974). EBES, a practical electron lithographic system. 21–22. 3 indexed citations

15.

Alles, D. S.. (1970). Information Transmission by Phantom Sensations. 11(1). 85–91. 177 indexed citations

16.

Alles, D. S., et al.. (1970). Device Photolithography: The Step-and-Repeat Camera. Bell System Technical Journal. 49(9). 2145–2177. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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