Chung Chan

1.4k total citations
66 papers, 1.3k citations indexed

About

Chung Chan is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Chung Chan has authored 66 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 32 papers in Mechanics of Materials and 18 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Chung Chan's work include Plasma Diagnostics and Applications (31 papers), Semiconductor materials and devices (29 papers) and Metal and Thin Film Mechanics (27 papers). Chung Chan is often cited by papers focused on Plasma Diagnostics and Applications (31 papers), Semiconductor materials and devices (29 papers) and Metal and Thin Film Mechanics (27 papers). Chung Chan collaborates with scholars based in United States, Hong Kong and Canada. Chung Chan's co-authors include Paul K. Chu, Shu Qin, N. Hershkowitz, N.W. Cheung, Lawrence A. Larson, Karl E. Lonngren, T. Intrator, F. Ze, Dixon T. K. Kwok and B. A. Nelson and has published in prestigious journals such as Physical Review Letters, Journal of Geophysical Research Atmospheres and Applied Physics Letters.

In The Last Decade

Chung Chan

65 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Chung Chan United States 20 789 549 352 343 184 66 1.3k
N. A. Azarenkov Ukraine 16 379 0.5× 205 0.4× 331 0.9× 389 1.1× 181 1.0× 126 891
P. I. John India 13 201 0.3× 228 0.4× 201 0.6× 223 0.7× 164 0.9× 58 621
D. J. Rej United States 21 347 0.4× 349 0.6× 311 0.9× 138 0.4× 300 1.6× 66 1.1k
T. Tachibana Japan 19 564 0.7× 181 0.3× 542 1.5× 328 1.0× 63 0.3× 84 1.4k
Cormac Corr Australia 20 834 1.1× 274 0.5× 396 1.1× 264 0.8× 41 0.2× 71 1.2k
S. V. Garnov Russia 21 711 0.9× 379 0.7× 548 1.6× 751 2.2× 51 0.3× 136 1.7k
E. J. Yadlowsky United States 12 154 0.2× 125 0.2× 215 0.6× 191 0.6× 106 0.6× 44 650
O. Weis Germany 16 214 0.3× 278 0.5× 479 1.4× 317 0.9× 62 0.3× 61 855
P. Gaal Germany 19 766 1.0× 90 0.2× 298 0.8× 691 2.0× 101 0.5× 50 1.3k
Toshimitsu Mochizuki Japan 18 591 0.7× 329 0.6× 186 0.5× 608 1.8× 23 0.1× 110 1.2k

Countries citing papers authored by Chung Chan

Since Specialization
Citations

This map shows the geographic impact of Chung Chan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chung Chan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chung Chan more than expected).

Fields of papers citing papers by Chung Chan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chung Chan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chung Chan. The network helps show where Chung Chan may publish in the future.

Co-authorship network of co-authors of Chung Chan

This figure shows the co-authorship network connecting the top 25 collaborators of Chung Chan. A scholar is included among the top collaborators of Chung Chan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chung Chan. Chung Chan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Tian, Xiubo, Dixon T. K. Kwok, Paul K. Chu, & Chung Chan. (2002). Nitrogen depth profiles in plasma implanted stainless steel. Physics Letters A. 299(5-6). 577–580. 12 indexed citations
2.
Chan, Chung, et al.. (2000). Chemical structure modification of silicone surfaces by plasma immersion ion implantation. Journal of Materials Science Letters. 19(21). 1883–1885. 7 indexed citations
3.
Asquith, J.C., et al.. (1998). A two-dimensional numerical model of a floating-gate EEPROM transistor. International Journal of Electronics. 85(6). 697–712. 1 indexed citations
4.
Qin, Shu, Yuanzhong Zhou, Chung Chan, & Paul K. Chu. (1998). Fabrication of low dielectric constant materials for ULSI multilevel interconnection by plasma ion implantation. IEEE Electron Device Letters. 19(11). 420–422. 8 indexed citations
5.
Chu, Paul K., et al.. (1998). Sample stage induced dose and energy nonuniformity in plasma immersion ion implantation of silicon. Applied Physics Letters. 73(2). 202–204. 24 indexed citations
6.
Chu, Paul K., Shu Qin, Chung Chan, N.W. Cheung, & Lawrence A. Larson. (1996). Plasma immersion ion implantation—a fledgling technique for semiconductor processing. Materials Science and Engineering R Reports. 17(6-7). 207–280. 308 indexed citations
7.
Qin, Shu, et al.. (1996). N-Type Doping by Plasma Ion Implantation Using a PH3 SDS System. MRS Proceedings. 438. 2 indexed citations
8.
Chu, Paul K., Chung Chan, & N.W. Cheung. (1996). Recent Applications of Plasma Immersion Ion Implantation. 19(6). 165–172. 7 indexed citations
9.
Qin, Shu, et al.. (1995). Hydrogen Etching Effects During Plasma Doping Processes and Impact on Shallow Junction Formation. MRS Proceedings. 396. 2 indexed citations
10.
Qin, Shu, et al.. (1995). An investigation of dopant gases in plasma immersion ion implantation. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 106(1-4). 636–640. 13 indexed citations
11.
Qin, Shu, et al.. (1994). Etching and Charging Effects on Dose in Plasma Immersion Ion Implantation. MRS Proceedings. 354. 1 indexed citations
12.
Qin, Shu, et al.. (1993). Charge transfer cross section of He+ in collisional helium plasma using the plasma immersion ion implantation technique. Journal of Applied Physics. 74(3). 1548–1552. 5 indexed citations
13.
Chan, Chung, et al.. (1993). Modeling and experiment on plasma source ion implantation. Journal of Applied Physics. 73(8). 3651–3656. 19 indexed citations
14.
Singh, Nagendra & Chung Chan. (1992). Effects of equatorially trapped ions on refilling of the plasmasphere. Journal of Geophysical Research Atmospheres. 97(A2). 1167–1179. 13 indexed citations
15.
Chan, Chung, et al.. (1987). Parametric investigation of the sheath potential in a low-frequency rf discharge. Journal of Applied Physics. 62(5). 1633–1638. 16 indexed citations
16.
Chan, Chung, et al.. (1986). Experimental Observation of Slow Ion Acoustic Double Layers. Physical Review Letters. 57(24). 3050–3053. 20 indexed citations
17.
Chan, Chung, et al.. (1984). Laboratory Evidence for Ion-Acoustic—Type Double Layers. Physical Review Letters. 52(20). 1782–1785. 63 indexed citations
18.
Chan, Chung, et al.. (1981). Excitation of multiple ion-acoustic shocks. The Physics of Fluids. 24(8). 1452–1455. 26 indexed citations
19.
Nelson, B. A., et al.. (1981). Radiation Characteristics of Ion Acoustic Solitons Launched from an Antenna. IEEE Transactions on Plasma Science. 9(3). 101–103. 16 indexed citations
20.
Ze, F., N. Hershkowitz, Chung Chan, & Karl E. Lonngren. (1979). Inelastic Collision of Spherical Ion-Acoustic Solitons. Physical Review Letters. 42(26). 1747–1750. 41 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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