Charles L. Dezelah

754 citations

22 papers · 589 indexed · h-index 15

Co-authors: Charles H. Winter Lauri Niinistö Kai Arstila John F. Conley Jaakko Niinistö Ravindra K. Kanjolia Oussama M. El‐Kadri Mary Jane Heeg
Topics: Semiconductor materials and devices (21 papers)Electronic and Structural Properties of Oxides (8 papers)Catalytic Processes in Materials Science (7 papers)
Cited by: Electronic, Optical and Magnetic Materials Materials Chemistry Electrical and Electronic Engineering
Journals: Journal of the American Chemical Society The Journal of Chemical Physics Chemistry of Materials
Partner nations: United States Finland Sweden

In The Last Decade

Charles L. Dezelah

22 papers receiving 581 citations

Peers

Countries citing papers authored by Charles L. Dezelah

Since Specialization

Citations

This map shows the geographic impact of Charles L. Dezelah's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Charles L. Dezelah with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Charles L. Dezelah more than expected).

Fields of papers citing papers by Charles L. Dezelah

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Charles L. Dezelah. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Charles L. Dezelah. The network helps show where Charles L. Dezelah may publish in the future.

Co-authorship network of co-authors of Charles L. Dezelah

This figure shows the co-authorship network connecting the top 25 collaborators of Charles L. Dezelah. A scholar is included among the top collaborators of Charles L. Dezelah based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Charles L. Dezelah. Charles L. Dezelah is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

#	Work	Indexed citations
1	Synthesis of Micron-Sized WS₂ Crystallites Using Atomic Layer Deposition and Sulfur Annealing 2023 ·Chemistry of Materials ·(unknown),Rafik Addou,Charles L. Dezelah,D.F. Moser,Ravindra K. Kanjolia,Jacob Woodruff,John F. Conley	8
2	Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor 2022 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),(unknown),Charles L. Dezelah,D.F. Moser,Ravindra K. Kanjolia,D. J. Tweet,John F. Conley	4
3	Improved properties of atomic layer deposited ruthenium via postdeposition annealing 2021 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·M.H.B. Hayes,(unknown),Jacob Woodruff,D.F. Moser,Charles L. Dezelah,John F. Conley	8
4	Atomic Layer Deposition of Transparent p-Type Semiconducting Nickel Oxide Using Ni(^tBu2DAD)₂ and Ozone 2019 ·ACS Applied Materials & Interfaces ·(unknown),Charles L. Dezelah,John F. Conley	28
5	Mechanistic study of the atomic layer deposition of scandium oxide films using Sc(MeCp)2(Me2pz) and ozone 2019 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),(unknown),Ming Fang,J.‐M. Lehn,Charles L. Dezelah,Ravindra K. Kanjolia,Yves J. Chabal	9
6	Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)₃ and Water 2019 ·Chemistry of Materials ·(unknown),Duy Le,Asim Khaniya,Charles L. Dezelah,Jacob Woodruff,Ravindra K. Kanjolia,William E. Kaden,Talat S. Rahman,Parag Banerjee	24
7	Correction to Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero Oxidation State Precursor 2018 ·Chemistry of Materials ·(unknown),(unknown),(unknown),(unknown),David Price,Charles L. Dezelah,John F. Conley	6
8	Properties of Annealed Atomic-Layer-Deposited Ruthenium from Ru(DMBD)(CO)₃and Oxygen 2018 ·ECS Transactions ·M.H.B. Hayes,Charles L. Dezelah,John F. Conley	6
9	Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe₂)₃: Ozone versus Water 2018 ·Chemistry of Materials ·(unknown),(unknown),(unknown),Charith E. Nanayakkara,(unknown),D.F. Moser,Luis Fabián Peña,Eric C. Mattson,Charles L. Dezelah,Ravindra K. Kanjolia,Yves J. Chabal	21
10	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor 2017 ·Chemistry of Materials ·(unknown),(unknown),(unknown),(unknown),David Price,Charles L. Dezelah,John F. Conley	63
11	Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone 2017 ·Langmuir ·Charith E. Nanayakkara,Liu Guo,(unknown),Charles L. Dezelah,Ravindra K. Kanjolia,Yves J. Chabal	5
12	Role of Initial Precursor Chemisorption on Incubation Delay for Molybdenum Oxide Atomic Layer Deposition 2016 ·Chemistry of Materials ·Charith E. Nanayakkara,(unknown),Liu Guo,Charles L. Dezelah,Ravindra K. Kanjolia,Yves J. Chabal	22
13	Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid 2016 ·The Journal of Chemical Physics ·(unknown),(unknown),Sara M. Rupich,Charles L. Dezelah,Ravindra K. Kanjolia,Yves J. Chabal,Charles H. Winter	35
14	The Atomic Layer Deposition of HfO₂ and ZrO₂ using Advanced Metallocene Precursors and H₂O as the Oxygen Source 2008 ·Chemical Vapor Deposition ·Charles L. Dezelah,Jaakko Niinistö,Kaupo Kukli,Frans Munnik,Jun Lu,Mikko Ritala,Markku Leskelä,Lauri Niinistö	49
15	The growth of Er_xGa_2−xO₃films by atomic layer deposition from two different precursor systems 2007 ·Journal of Materials Chemistry ·Charles L. Dezelah,(unknown),Jani Päiväsaari,Kai Arstila,Lauri Niinistö,Charles H. Winter	14
16	A Pyrazolate-Based Metalorganic Tantalum Precursor That Exhibits High Thermal Stability and Its Use in the Atomic Layer Deposition of Ta₂O₅ 2007 ·Journal of the American Chemical Society ·Charles L. Dezelah,(unknown),Kenichiro Mizohata,Ronald J. Baird,Lauri Niinistö,Charles H. Winter	32
17	A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition 2007 ·Journal of Materials Chemistry ·Charles L. Dezelah,Oussama M. El‐Kadri,Kaupo Kukli,Kai Arstila,Ronald J. Baird,Jun Lu,Lauri Niinist�,Charles H. Winter	22
18	Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W₂(NMe₂)₆and Water: Precursor-Based Control of Oxidation State in the Thin Film Material 2006 ·Journal of the American Chemical Society ·Charles L. Dezelah,Oussama M. El‐Kadri,Imre Miklós Szilágyi,Joseph M. Campbell,Kai Arstila,Lauri Niinistö,Charles H. Winter	38
19	Atomic Layer Deposition of Ga₂O₃ Films from a Dialkylamido-Based Precursor 2005 ·Chemistry of Materials ·Charles L. Dezelah,Jaakko Niinistö,Kai Arstila,Lauri Niinistö,Charles H. Winter	72
20	Synthesis, structure and properties of volatile lanthanide complexes containing amidinate ligands: application for Er2O3 thin film growth by atomic layer deposition 2005 ·Journal of Materials Chemistry ·Jani Päiväsaari,Charles L. Dezelah,(unknown),Hani M. El‐Kaderi,Mary Jane Heeg,Matti Putkonen,Lauri Niinistö,Charles H. Winter	57

About Charles L. Dezelah

Charles L. Dezelah is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Materials Chemistry, having authored 22 papers that have together received 589 indexed citations. Recurring topics across this work include Semiconductor materials and devices (21 papers), Electronic and Structural Properties of Oxides (8 papers) and Catalytic Processes in Materials Science (7 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (153 citations), Materials Chemistry (370 citations) and Electrical and Electronic Engineering (432 citations). Charles L. Dezelah has collaborated with scholars based in United States, Finland and Sweden. Frequent co-authors include Charles H. Winter, Lauri Niinistö, Kai Arstila, John F. Conley, Jaakko Niinistö, Ravindra K. Kanjolia, Oussama M. El‐Kadri, Mary Jane Heeg, Yves J. Chabal and Kaupo Kukli. Their work appears in journals such as Journal of the American Chemical Society, The Journal of Chemical Physics and Chemistry of Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact