C.D. Schaper

493 total citations
28 papers, 358 citations indexed

About

C.D. Schaper is a scholar working on Electrical and Electronic Engineering, Control and Systems Engineering and Biomedical Engineering. According to data from OpenAlex, C.D. Schaper has authored 28 papers receiving a total of 358 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 9 papers in Control and Systems Engineering and 8 papers in Biomedical Engineering. Recurrent topics in C.D. Schaper's work include Advancements in Photolithography Techniques (7 papers), Silicon and Solar Cell Technologies (7 papers) and 3D IC and TSV technologies (6 papers). C.D. Schaper is often cited by papers focused on Advancements in Photolithography Techniques (7 papers), Silicon and Solar Cell Technologies (7 papers) and 3D IC and TSV technologies (6 papers). C.D. Schaper collaborates with scholars based in United States and Singapore. C.D. Schaper's co-authors include T. Kailath, Weng Khuen Ho, Arthur Tay, Dale E. Seborg, Duncan A. Mellichamp, Yong Jin Lee, Wallace E. Larimore, Masoud Moslehi, Krishna C. Saraswat and Stephen A. Norman and has published in prestigious journals such as Nanotechnology, IEEE Transactions on Control Systems Technology and Applied Physics A.

In The Last Decade

C.D. Schaper

26 papers receiving 336 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C.D. Schaper United States 13 192 146 64 62 41 28 358
Alkis Hatzopoulos Greece 12 458 2.4× 67 0.5× 90 1.4× 23 0.4× 14 0.3× 107 532
Diego Bellan Italy 15 444 2.3× 87 0.6× 55 0.9× 34 0.5× 26 0.6× 87 525
Giordano Spadacini Italy 18 1.0k 5.3× 167 1.1× 23 0.4× 46 0.7× 24 0.6× 121 1.1k
Yi-Sheng Su Taiwan 10 105 0.5× 145 1.0× 54 0.8× 183 3.0× 9 0.2× 32 404
Teruo Tsuji Japan 10 141 0.7× 337 2.3× 34 0.5× 116 1.9× 5 0.1× 83 474
Tae-Kyung Chung South Korea 11 319 1.7× 128 0.9× 16 0.3× 104 1.7× 11 0.3× 28 408
William F. Feehery United States 8 54 0.3× 329 2.3× 25 0.4× 33 0.5× 8 0.2× 8 482
B. Szabados Canada 12 340 1.8× 157 1.1× 15 0.2× 119 1.9× 8 0.2× 68 450
Sergey Y. Yurish Spain 10 285 1.5× 44 0.3× 162 2.5× 27 0.4× 6 0.1× 49 472
F. Rotella France 13 64 0.3× 361 2.5× 27 0.4× 54 0.9× 12 0.3× 59 451

Countries citing papers authored by C.D. Schaper

Since Specialization
Citations

This map shows the geographic impact of C.D. Schaper's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C.D. Schaper with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C.D. Schaper more than expected).

Fields of papers citing papers by C.D. Schaper

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C.D. Schaper. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C.D. Schaper. The network helps show where C.D. Schaper may publish in the future.

Co-authorship network of co-authors of C.D. Schaper

This figure shows the co-authorship network connecting the top 25 collaborators of C.D. Schaper. A scholar is included among the top collaborators of C.D. Schaper based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C.D. Schaper. C.D. Schaper is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Mao, Shau‐Gang, C.D. Schaper, & R. F. Karlicek. (2013). Nanopatterning using a simple bi-layer lift-off process for the fabrication of a photonic crystal nanostructure. Nanotechnology. 24(8). 85302–85302. 13 indexed citations
2.
Lee, Heon, et al.. (2007). Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 121-123. 661–664. 3 indexed citations
3.
Park, PooGyeon, C.D. Schaper, & T. Kailath. (2005). Control strategy for temperature tracking in rapid thermal processing of semiconductor wafers. 2568–2573. 1 indexed citations
4.
Tsai, K. Y., C.D. Schaper, & T. Kailath. (2004). Design of Feedforward Filters for Improving Tracking Performances of Existing Feedback Control Systems. IEEE Transactions on Control Systems Technology. 12(5). 742–749. 7 indexed citations
5.
Schaper, C.D., et al.. (2004). Programmable Thermal Processing Module for Semiconductor Substrates. IEEE Transactions on Control Systems Technology. 12(4). 493–509. 17 indexed citations
6.
Schaper, C.D., et al.. (2004). Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array. Applied Physics A. 80(4). 899–902. 8 indexed citations
7.
Ho, Weng Khuen, et al.. (2002). Resist film uniformity in the microlithography process. IEEE Transactions on Semiconductor Manufacturing. 15(3). 323–330. 16 indexed citations
8.
Aghajan, Hamid K., C.D. Schaper, & T. Kailath. (2002). Edge detection for optical image metrology using unsupervised neural network learning. 1. 188–197.
9.
Schaper, C.D., et al.. (2002). Real-time predictive control of photoresist film thickness uniformity. IEEE Transactions on Semiconductor Manufacturing. 15(1). 51–59. 32 indexed citations
10.
Ho, Weng Khuen, Arthur Tay, & C.D. Schaper. (2000). Optimal predictive control with constraints for the processing of semiconductor wafers on bake plates. IEEE Transactions on Semiconductor Manufacturing. 13(1). 88–96. 26 indexed citations
11.
Schaper, C.D., T. Kailath, & Yong Jin Lee. (1999). Decentralized control of wafer temperature for multizone rapid thermal processing systems. IEEE Transactions on Semiconductor Manufacturing. 12(2). 193–199. 32 indexed citations
12.
Schaper, C.D., et al.. (1999). Integrated bake/chill for photoresist processing. IEEE Transactions on Semiconductor Manufacturing. 12(2). 264–266. 15 indexed citations
13.
Moslehi, Mehrdad M., Ajit Paranjpe, John Kuehne, et al.. (1994). Fast-cycle-time single-wafer IC manufacturing. Microelectronic Engineering. 25(2-4). 93–130. 1 indexed citations
14.
Schaper, C.D., Masoud Moslehi, Krishna C. Saraswat, & T. Kailath. (1994). Control of MMST RTP: repeatability, uniformity, and integration for flexible manufacturing [ICs]. IEEE Transactions on Semiconductor Manufacturing. 7(2). 202–219. 27 indexed citations
15.
Schaper, C.D., Wallace E. Larimore, Dale E. Seborg, & Duncan A. Mellichamp. (1994). Identification of chemical processes using canonical variate analysis. Computers & Chemical Engineering. 18(1). 55–69. 41 indexed citations
16.
Schaper, C.D., et al.. (1992). Low-order modeling and dynamic characterization of rapid thermal processing. Applied Physics A. 54(4). 317–326. 20 indexed citations
17.
Schaper, C.D., et al.. (1991). In-Situ Temperature Estimation in Rapid Thermal Processing Systems using Extended Kalman Filtering. MRS Proceedings. 224. 10 indexed citations
18.
Schaper, C.D., Duncan A. Mellichamp, & Dale E. Seborg. (1990). Robust control of a wastewater treatment system. 2035–2040 vol.4. 7 indexed citations
19.
Powers, J.T., et al.. (1990). Impact of direct load control programs: A duty-cycle approach. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information).
20.
Schaper, C.D., Wallace E. Larimore, Dale E. Seborg, & Duncan A. Mellichamp. (1990). Identification of chemical processes using canonical variate analysis. 10. 605–610 vol.2. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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