C. Nouvellon

470 total citations
11 papers, 393 citations indexed

About

C. Nouvellon is a scholar working on Mechanics of Materials, Materials Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, C. Nouvellon has authored 11 papers receiving a total of 393 indexed citations (citations by other indexed papers that have themselves been cited), including 10 papers in Mechanics of Materials, 7 papers in Materials Chemistry and 4 papers in Electrical and Electronic Engineering. Recurrent topics in C. Nouvellon's work include Diamond and Carbon-based Materials Research (6 papers), Laser-induced spectroscopy and plasma (5 papers) and Metal and Thin Film Mechanics (5 papers). C. Nouvellon is often cited by papers focused on Diamond and Carbon-based Materials Research (6 papers), Laser-induced spectroscopy and plasma (5 papers) and Metal and Thin Film Mechanics (5 papers). C. Nouvellon collaborates with scholars based in Belgium, France and Netherlands. C. Nouvellon's co-authors include Catherine Chaleard, P. Mauchien, A. Semerok, B. Sallé, Vincent Detalle, Jean Luc Lacour, J. P. Dauchot, Stéphanos Konstantinidis, P. Meynadier and M. Perdrix and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and Thin Solid Films.

In The Last Decade

C. Nouvellon

10 papers receiving 377 citations

Peers

C. Nouvellon

MM

CM

MC

EEE

BE

Asma Hayat Pakistan

Khaliq Mahmood Pakistan

Mihai Stafe Romania

Rie Tanabe Japan

Xiaochang Ni China

G.P. Parisi Italy

T. Sarnet France

P. A. Pivovarov Russia

Tomasz Mościcki Poland

S. Petzoldt Germany

Asma Hayat Pakistan

C. Nouvellon

472 ×1.6

MM

268 ×2.0

CM

186 ×1.5

MC

109 ×1.2

EEE

66 ×0.9

BE

Citations per year, relative to C. Nouvellon C. Nouvellon (= 1×) peers Asma Hayat

Countries citing papers authored by C. Nouvellon

Since Specialization

Citations

This map shows the geographic impact of C. Nouvellon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Nouvellon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Nouvellon more than expected).

Fields of papers citing papers by C. Nouvellon

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Nouvellon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Nouvellon. The network helps show where C. Nouvellon may publish in the future.

Co-authorship network of co-authors of C. Nouvellon

This figure shows the co-authorship network connecting the top 25 collaborators of C. Nouvellon. A scholar is included among the top collaborators of C. Nouvellon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Nouvellon. C. Nouvellon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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11 of 11 papers shown

1.

Santana, Y.Y., C. Nouvellon, Catherine Cordier, et al.. (2022). Influence of powder mixing method on properties of high entropy alloys of FeCrMnAlMo thin coatings obtained by magnetron sputtering. Surface and Coatings Technology. 446. 128744–128744. 12 indexed citations

2.

Nouvellon, C., L. Libralesso, Olivier Douhéret, et al.. (2016). WC/C:H films synthesized by an hybrid reactive magnetron sputtering/Plasma Enhanced Chemical Vapor Deposition process: An alternative to Cr (VI) based hard chromium plating. Thin Solid Films. 630. 79–85. 21 indexed citations

3.

Nouvellon, C., J. P. Dauchot, Catherine Archambeau, et al.. (2012). Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes. Surface and Coatings Technology. 206(16). 3542–3549. 46 indexed citations

4.

Nouvellon, C., et al.. (2005). Chromium reactive sputtering in argon–oxygen and argon–water vapor mixtures. Surface and Coatings Technology. 200(1-4). 425–430. 2 indexed citations

5.

Overschelde, O. Van, et al.. (2005). Excimer laser ablation of thin titanium oxide films on glass. Applied Surface Science. 252(13). 4722–4727. 14 indexed citations

6.

Nouvellon, C., Stéphanos Konstantinidis, J. P. Dauchot, et al.. (2002). Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges. Journal of Applied Physics. 92(1). 32–36. 25 indexed citations

7.

Ricard, A., C. Nouvellon, Stéphanos Konstantinidis, et al.. (2002). Density and temperature in an inductively amplified magnetron discharge for titanium deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(4). 1488–1491. 53 indexed citations

8.

Semerok, A., Catherine Chaleard, Vincent Detalle, et al.. (1999). Experimental investigations of laser ablation efficiency of pure metals with femto, pico and nanosecond pulses. Applied Surface Science. 138-139. 311–314. 174 indexed citations

9.

Nouvellon, C., Catherine Chaleard, Jean Luc Lacour, & P. Mauchien. (1999). Stoichiometry study of laser produced plasma by optical emission spectroscopy. Applied Surface Science. 138-139. 306–310. 8 indexed citations

10.

Sallé, B., Catherine Chaleard, Vincent Detalle, et al.. (1999). Laser ablation efficiency of metal samples with UV laser nanosecond pulses. Applied Surface Science. 138-139. 302–305. 38 indexed citations

11.

Chaleard, Catherine, et al.. (1997). Analyse spectroscopique d'un plasma laser produit à pressionatmosphérique. Annales de Physique. 22. C1–113.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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