A.R. Krauss

6.3k total citations
141 papers, 5.2k citations indexed

About

A.R. Krauss is a scholar working on Materials Chemistry, Mechanics of Materials and Electrical and Electronic Engineering. According to data from OpenAlex, A.R. Krauss has authored 141 papers receiving a total of 5.2k indexed citations (citations by other indexed papers that have themselves been cited), including 118 papers in Materials Chemistry, 49 papers in Mechanics of Materials and 47 papers in Electrical and Electronic Engineering. Recurrent topics in A.R. Krauss's work include Diamond and Carbon-based Materials Research (51 papers), Metal and Thin Film Mechanics (48 papers) and Semiconductor materials and devices (36 papers). A.R. Krauss is often cited by papers focused on Diamond and Carbon-based Materials Research (51 papers), Metal and Thin Film Mechanics (48 papers) and Semiconductor materials and devices (36 papers). A.R. Krauss collaborates with scholars based in United States, Germany and Israel. A.R. Krauss's co-authors include D. M. Gruen, Orlando Auciello, Thomas McCauley, T. D. Corrigan, R. P. H. Chang, Daniel K. Zhou, Lu‐Chang Qin, Xianzheng Pan, Anirudha V. Sumant and Shengzhong Liu and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

A.R. Krauss

134 papers receiving 5.0k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A.R. Krauss United States 34 4.7k 2.3k 1.4k 972 742 141 5.2k
Yoichiro Sato Japan 35 4.9k 1.1× 2.1k 0.9× 1.8k 1.3× 977 1.0× 631 0.9× 124 5.8k
A. Hoffman Israel 39 5.5k 1.2× 2.6k 1.1× 1.9k 1.4× 897 0.9× 994 1.3× 311 6.2k
C. A. Davis United Kingdom 24 3.1k 0.7× 2.2k 0.9× 1.1k 0.8× 425 0.4× 587 0.8× 54 3.8k
M. Schreck Germany 34 4.0k 0.9× 1.5k 0.7× 1.9k 1.3× 1.2k 1.2× 496 0.7× 179 4.7k
Shigeki Otani Japan 44 5.1k 1.1× 1.4k 0.6× 1.4k 1.0× 1.6k 1.6× 529 0.7× 339 7.3k
J. Ristein Germany 41 5.5k 1.2× 1.2k 0.5× 3.2k 2.3× 1.4k 1.4× 600 0.8× 131 6.4k
Seiichiro Matsumoto Japan 19 2.9k 0.6× 1.8k 0.8× 792 0.6× 449 0.5× 331 0.4× 59 3.2k
Akiyoshi Chayahara Japan 31 2.9k 0.6× 1.6k 0.7× 1.6k 1.1× 691 0.7× 704 0.9× 256 3.9k
C.‐P. Klages Germany 33 2.1k 0.5× 1.4k 0.6× 1.6k 1.1× 470 0.5× 268 0.4× 148 3.6k
Christoph E. Nebel Germany 46 5.3k 1.1× 1.2k 0.5× 3.5k 2.5× 1.8k 1.8× 627 0.8× 299 7.3k

Countries citing papers authored by A.R. Krauss

Since Specialization
Citations

This map shows the geographic impact of A.R. Krauss's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A.R. Krauss with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A.R. Krauss more than expected).

Fields of papers citing papers by A.R. Krauss

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A.R. Krauss. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A.R. Krauss. The network helps show where A.R. Krauss may publish in the future.

Co-authorship network of co-authors of A.R. Krauss

This figure shows the co-authorship network connecting the top 25 collaborators of A.R. Krauss. A scholar is included among the top collaborators of A.R. Krauss based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A.R. Krauss. A.R. Krauss is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Krauss, A.R., Orlando Auciello, M.Q. Ding, et al.. (2001). Electron field emission for ultrananocrystalline diamond films. Journal of Applied Physics. 89(5). 2958–2967. 169 indexed citations
2.
Angadi, M. A., Orlando Auciello, A.R. Krauss, & Hartmut Gundel. (2000). The role of electrode material and polarization fatigue on electron emission from ferroelectric Pb(ZrxTi1−x)O3 cathodes. Applied Physics Letters. 77(17). 2659–2661. 30 indexed citations
3.
Krauss, A.R., A. M. Dhote, D. M. Gruen, et al.. (1998). Studies of metallic species and oxygen incorporation during sputter-deposition of SrBi2Ta2O9 films, using mass spectroscopy of recoiled ions. Applied Physics Letters. 72(20). 2529–2531. 6 indexed citations
4.
Erdemir, Ali, Michael Halter, G.R. Fenske, et al.. (1997). Durability and tribological performance of smooth diamond films produced by Ar-C60 microwave plasmas and by laser polishing. Surface and Coatings Technology. 94-95. 537–542. 53 indexed citations
5.
Erdemir, Ali, Michael Halter, G.R. Fenske, et al.. (1997). Friction and Wear Mechanisms of Smooth Diamond Films During Sliding in Air and Dry Nitrogen. Tribology Transactions. 40(4). 667–675. 53 indexed citations
6.
Krauss, A.R., D. M. Gruen, Daniel K. Zhou, et al.. (1997). Morphology and Electron Emission Properties of Nanocrystalline CVD Diamond Thin Films. MRS Proceedings. 495. 26 indexed citations
7.
Zuiker, C., et al.. (1996). Characterization of diamond films by core-level photoabsorption. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 1 indexed citations
8.
Zuiker, C., D. M. Gruen, & A.R. Krauss. (1996). In situ laser reflectance interferometry measurement of diamond film growth. Journal of Applied Physics. 79(7). 3541–3547. 31 indexed citations
9.
Auciello, Orlando, A.R. Krauss, D. M. Gruen, et al.. (1996). Studies of film growth processes and surface structural characterization of ferroelectric memory-compatible SrBi2Ta2O9 layered perovskites via in situ, real-time ion-beam analysis. Applied Physics Letters. 69(18). 2671–2673. 22 indexed citations
10.
Krauss, A.R., J. Schultz, Vincent S. Smentkowski, et al.. (1995). Pulsed ion beam characterization of CVD diamond surfaces under thin film deposition conditions. Thin Solid Films. 270(1-2). 130–136. 7 indexed citations
11.
Brooks, J.N., A.R. Krauss, R.E. Nygren, et al.. (1992). Summary of results from the TEXTOR helium self-pumping experiment. Journal of Nuclear Materials. 196-198. 664–669. 8 indexed citations
12.
Auciello, Orlando, et al.. (1990). A Critical Analysis of Techniques and Basic Phenomena Related to Deposition of High Temperature Superconducting Thin Films. Scanning microscopy. 4(2). 203–226. 4 indexed citations
13.
Kingon, A. I., et al.. (1989). Deposition of electrooptic thin films. Applied Categorical Structures. 23–27. 2 indexed citations
14.
15.
Auciello, Orlando & A.R. Krauss. (1988). Proof-of-principle of a novel method for sputter-deposition of high Tc supeconducting films via a computer-controlled mass analyzed ion beam. AIP conference proceedings. 165. 114–121. 4 indexed citations
16.
Schmidt, H., L. R. Anderson, J. Schultz, et al.. (1988). Quantification of surface Li in 16.4% CuLi alloys by direct recoil and Auger analysis of element specific chemisorption complexes. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 6(3). 2073–2076. 2 indexed citations
17.
Krauss, A.R., et al.. (1987). Particle and photon interactions with surfaces. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 3 indexed citations
18.
Krauss, A.R., et al.. (1987). Charge transfer processes and sputtering processes of self-sustaining alkali metal coatings on metal surfaces. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 27(1). 209–220. 8 indexed citations
19.
Krauss, A.R., D. M. Gruen, N.Q. Lam, & Α. Dewald. (1984). Sputtering properties of copper-lithium alloys at reactor-level temperatures and surface erosion rates. Journal of Nuclear Materials. 128-129. 570–576. 21 indexed citations
20.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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