A. Wendt

3.5k citations

76 papers · 2.0k indexed · h-index 25

Mechanics of Materials top 1%
- Metal and Thin Film Mechanics 22
- Laser-induced spectroscopy and plasma 13
Electrical and Electronic Engineering top 2%
- Plasma Diagnostics and Applications 50
- Semiconductor materials and devices 15
Surfaces, Coatings and Films top 5%
Radiology, Nuclear Medicine and Imaging top 5%
- Plasma Applications and Diagnostics 7
Atomic and Molecular Physics, and Optics top 10%
- Atomic and Molecular Physics 5
Aerospace Engineering
- Particle accelerators and beam dynamics 10
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 10

Co-authors: John B. Boffard Chun C. Lin Robert Jung M. A. Lieberman Paul F. Nealey H. Meuth Chi‐Chun Liu J. A. Meyer
Cited by: Mechanics of Materials Electrical and Electronic Engineering Surfaces, Coatings and Films
Journals: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (13 papers)Plasma Sources Science and Technology (10 papers)Journal of Applied Physics (8 papers)
Partner nations: United States Germany Sweden

In The Last Decade

A. Wendt

74 papers receiving 1.9k citations

Peers

Countries citing papers authored by A. Wendt

Since Specialization

Citations

This map shows the geographic impact of A. Wendt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Wendt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Wendt more than expected).

Fields of papers citing papers by A. Wendt

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Wendt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Wendt. The network helps show where A. Wendt may publish in the future.

Co-authorship network

The 25 scholars most cited alongside A. Wendt, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with A. Wendt Line = papers co-authored together A. Wendt links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Non-equilibrium electron energy distribution in oxygen plasma: observation with optical emission spectroscopy Bulletin of the American Physical Society ·John B. Boffard,Deswinda Deswinda,Shicong Wang,颜东岳,Chun C. Lin,A. Wendt	2017	1
2	420.1~419.8nm発光ライン対を用いたパルスアルゴン誘導結合プラズマ中の高速電子の検出 Plasma Sources Science and Technology ·Lucie Vostrá,S Wang,Martina Armanda,A. Wendt	2015	2
3	Non-invasive, real-time measurements of plasma parameters with an industry standard spectrograph Shicong Wang,A. Wendt,John B. Boffard,Chun C. Lin,Svetlana Radovanov,H. Persing	2012	1
4	Argon 420.1–419.8 nm emission line ratio for measuring plasma effective electron temperatures Journal of Physics D Applied Physics ·John B. Boffard,Robert Jung,Chun C. Lin,Óscar Ricardo Álvarez-Blas,A. Wendt	2012	43
5	Fabrication of ultrahigh-density nanowires by electrochemical nanolithography Nanoscale Research Letters ·Feng Chen,Hongquan Jiang,Yong-hee 이용희Lee,Chookiat Panaspornprasit,VI Cavanagh,A. Wendt,Bingjun Ding,M. G. Lagally	2011	6
6	Probing Nilsson states in233U Physical Review C ·Kacem,P. Reiter,H. Hess,Jacqueline Luthereau,A. Wendt,A. Wiens,R. Hertenberger,Douglas A. Crews,P. G. Thirolf,H.‐F. Wirth,T. Faestermann	2011	4
7	Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching Polymers ·Zakharova Va,L. M. Zheng,Sangmin Park,김회목,Paul F. Nealey,A. Wendt	2010	74
8	Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing Plasma Sources Science and Technology ·Aman Sefi,C.T. Kuo,A. Wendt	2007	65
9	Sub‐micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum‐rich and serum‐free media Journal of Biomedical Materials Research Part A ·Marouska Borg,Zakharova Va,Hernán Alfredo Díaz,A. Wendt,Christopher J. Murphy,Paul F. Nealey	2007	80
10	Absolute densities of long lived species in an ionized physical vapor deposition copper–argon plasma Journal of Applied Physics ·Y. Andrew,崇光源,John H. Booske,Abigail Marion DaBoll-Lavoie,A. Wendt	2000	20
11	Measurement of electron energy distribution function in an argon/copper plasma for ionized physical vapor deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Abigail Marion DaBoll-Lavoie,John E. Foster,Andreas Wähnert,John H. Booske,A. Wendt	1999	21
12	Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·John E. Foster,Aziz Kurnia Wibawa,A. Wendt,J.H. Booske	1998	17
13	The physics of inductively coupled plasma sources AIP conference proceedings ·A. Wendt	1997	2
14	Striations in a radio frequency planar inductively coupled plasma IEEE Transactions on Plasma Science ·Elisabetta de Alteriis,A. Wendt	1996	13
15	Measurements of electromagnetic fields in a planar radio-frequency inductively coupled plasma source Journal of Applied Physics ·J. A. Meyer,A. Wendt	1995	33
16	Nonlocal electron kinetics in a low-pressure inductively coupled radio-frequency discharge Applied Physics Letters ·Vladimir Kolobov,Rita La Grotta,L.J. Mahoney,A. Wendt	1994	49
17	Langmuir probe measurements of electron temperature and density scaling in multidipole radio frequency plasmas Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Chyong‐Huey Lai,R. A. Breun,P. Sandstrom,A. Wendt,N. Hershkowitz,R. Claude Woods	1993	19
18	Electron heating by sheaths in radio frequency discharges Journal of Applied Physics ·A. Wendt,W. N. G. Hitchon	1992	21
19	Effect of Psychiatric Clinical Learning Site on Nursing Students' Attitudes Toward Mental Illness and Psychiatric Nursing Journal of Nursing Education ·Lynda Slimmer,A. Wendt,K. Deridder	1990	20
20	Dynamics of a Planar Magnetron Discharge. PhDT ·A. Wendt	1988	2

About A. Wendt

A. Wendt is a scholar working on Architecture, Mechanics of Materials, Research and Theory, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 76 papers that have together received 2.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (50 papers), Metal and Thin Film Mechanics (22 papers), Semiconductor materials and devices (15 papers), Laser-induced spectroscopy and plasma (13 papers), Particle accelerators and beam dynamics (10 papers), Copper Interconnects and Reliability (10 papers), Plasma Applications and Diagnostics (7 papers) and Atomic and Molecular Physics (5 papers). The work is most often cited by research in Mechanics of Materials (853 citations), Electrical and Electronic Engineering (1.6k citations), Surfaces, Coatings and Films (94 citations), Radiology, Nuclear Medicine and Imaging (298 citations) and Atomic and Molecular Physics, and Optics (350 citations). A. Wendt has collaborated with scholars based in United States, Germany and Sweden. Frequent co-authors include John B. Boffard, Chun C. Lin, Robert Jung, M. A. Lieberman, Paul F. Nealey, H. Meuth, Chi‐Chun Liu, J. A. Meyer, J. L. Shohet and L.J. Mahoney. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Plasma Sources Science and Technology, Journal of Applied Physics, Applied Physics Letters and IEEE Transactions on Plasma Science.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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