A. Wendt

3.5k total citations
76 papers, 2.0k citations indexed

About

A. Wendt is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, A. Wendt has authored 76 papers receiving a total of 2.0k indexed citations (citations by other indexed papers that have themselves been cited), including 57 papers in Electrical and Electronic Engineering, 29 papers in Mechanics of Materials and 13 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in A. Wendt's work include Plasma Diagnostics and Applications (50 papers), Metal and Thin Film Mechanics (22 papers) and Semiconductor materials and devices (15 papers). A. Wendt is often cited by papers focused on Plasma Diagnostics and Applications (50 papers), Metal and Thin Film Mechanics (22 papers) and Semiconductor materials and devices (15 papers). A. Wendt collaborates with scholars based in United States, Germany and Sweden. A. Wendt's co-authors include John B. Boffard, Chun C. Lin, Robert Jung, M. A. Lieberman, Paul F. Nealey, H. Meuth, Chi‐Chun Liu, J. A. Meyer, J. L. Shohet and L.J. Mahoney and has published in prestigious journals such as Advanced Materials, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

A. Wendt

74 papers receiving 1.9k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A. Wendt United States 25 1.6k 853 458 350 298 76 2.0k
Daniel Poitras Canada 25 1.8k 1.1× 254 0.3× 645 1.4× 1.1k 3.2× 29 0.1× 127 2.5k
D. Gerstenberg United States 13 1.1k 0.7× 541 0.6× 725 1.6× 545 1.6× 24 0.1× 20 2.0k
G.A. Haas United States 22 671 0.4× 119 0.1× 608 1.3× 600 1.7× 40 0.1× 77 1.5k
J. Gasiot France 21 2.0k 1.3× 131 0.2× 1.4k 3.1× 327 0.9× 16 0.1× 106 2.8k
A. Cavallini Italy 30 2.8k 1.8× 128 0.2× 1.1k 2.4× 1.2k 3.4× 31 0.1× 242 3.5k
Jan‐Otto Carlsson Sweden 25 989 0.6× 342 0.4× 1.1k 2.4× 345 1.0× 8 0.0× 89 1.8k
K.M. Geib United States 34 3.4k 2.1× 207 0.2× 699 1.5× 2.4k 7.0× 28 0.1× 177 4.1k
M. Piacentini Italy 25 732 0.5× 45 0.1× 846 1.8× 607 1.7× 170 0.6× 97 1.8k
Shigeaki Zaima Japan 33 4.0k 2.6× 345 0.4× 1.9k 4.0× 2.1k 5.9× 43 0.1× 385 5.2k
W. S. Hobson United States 30 3.2k 2.1× 237 0.3× 1.0k 2.2× 1.9k 5.4× 28 0.1× 250 4.0k

Countries citing papers authored by A. Wendt

Since Specialization
Citations

This map shows the geographic impact of A. Wendt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Wendt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Wendt more than expected).

Fields of papers citing papers by A. Wendt

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Wendt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Wendt. The network helps show where A. Wendt may publish in the future.

Co-authorship network of co-authors of A. Wendt

This figure shows the co-authorship network connecting the top 25 collaborators of A. Wendt. A scholar is included among the top collaborators of A. Wendt based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Wendt. A. Wendt is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Boffard, John B., et al.. (2017). Non-equilibrium electron energy distribution in oxygen plasma: observation with optical emission spectroscopy. Bulletin of the American Physical Society. 2017. 1 indexed citations
2.
Wendt, A., et al.. (2015). 420.1~419.8nm発光ライン対を用いたパルスアルゴン誘導結合プラズマ中の高速電子の検出. Plasma Sources Science and Technology. 24(6). 1–14. 2 indexed citations
3.
Wang, Shicong, A. Wendt, John B. Boffard, et al.. (2012). Non-invasive, real-time measurements of plasma parameters with an industry standard spectrograph. 1 indexed citations
4.
Boffard, John B., et al.. (2012). Argon 420.1–419.8 nm emission line ratio for measuring plasma effective electron temperatures. Journal of Physics D Applied Physics. 45(4). 45201–45201. 43 indexed citations
5.
Chen, Feng, et al.. (2011). Fabrication of ultrahigh-density nanowires by electrochemical nanolithography. Nanoscale Research Letters. 6(1). 444–444. 6 indexed citations
6.
Reiter, P., H. Hess, A. Wendt, et al.. (2011). Probing Nilsson states in233U. Physical Review C. 84(1). 4 indexed citations
7.
Park, Sangmin, et al.. (2010). Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching. Polymers. 2(4). 649–663. 74 indexed citations
8.
Wendt, A., et al.. (2007). Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing. Plasma Sources Science and Technology. 16(2). 257–264. 65 indexed citations
9.
Wendt, A., et al.. (2007). Sub‐micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum‐rich and serum‐free media. Journal of Biomedical Materials Research Part A. 86A(3). 725–735. 80 indexed citations
10.
Andrew, Y., et al.. (2000). Absolute densities of long lived species in an ionized physical vapor deposition copper–argon plasma. Journal of Applied Physics. 88(6). 3208–3219. 20 indexed citations
11.
Foster, John E., et al.. (1999). Measurement of electron energy distribution function in an argon/copper plasma for ionized physical vapor deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(3). 840–844. 21 indexed citations
12.
Foster, John E., et al.. (1998). Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(2). 532–535. 17 indexed citations
13.
Wendt, A.. (1997). The physics of inductively coupled plasma sources. AIP conference proceedings. 435–442. 2 indexed citations
14.
Wendt, A., et al.. (1996). Striations in a radio frequency planar inductively coupled plasma. IEEE Transactions on Plasma Science. 24(1). 125–126. 13 indexed citations
15.
Meyer, J. A. & A. Wendt. (1995). Measurements of electromagnetic fields in a planar radio-frequency inductively coupled plasma source. Journal of Applied Physics. 78(1). 90–96. 33 indexed citations
16.
Kolobov, Vladimir, et al.. (1994). Nonlocal electron kinetics in a low-pressure inductively coupled radio-frequency discharge. Applied Physics Letters. 65(5). 537–539. 49 indexed citations
17.
Lai, Chyong‐Huey, R. A. Breun, P. Sandstrom, et al.. (1993). Langmuir probe measurements of electron temperature and density scaling in multidipole radio frequency plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(4). 1199–1205. 19 indexed citations
18.
Wendt, A. & W. N. G. Hitchon. (1992). Electron heating by sheaths in radio frequency discharges. Journal of Applied Physics. 71(10). 4718–4726. 21 indexed citations
19.
Slimmer, Lynda, et al.. (1990). Effect of Psychiatric Clinical Learning Site on Nursing Students' Attitudes Toward Mental Illness and Psychiatric Nursing. Journal of Nursing Education. 29(3). 127–133. 20 indexed citations
20.
Wendt, A.. (1988). Dynamics of a Planar Magnetron Discharge.. PhDT. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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