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Works of Y. Catherine being referenced
Reaction mechanisms of the radio frequency glow discharged deposition process in silane-helium
1979
Formation de dépôts de nitrure de silicium en couche mince obtenus par réaction chimique dans une décharge R.F. Basse pression
1976
Reactive plasma deposited SixCyHz films
1979
Structure and physical properties of plasma-grown amorphous hydrogenated carbon films
1987
Computer simulation of a carbon-deposition plasma in CH/sub 4/
1991
Reaction mechanisms in plasma deposition of SixC1-x:H films
1981
Deposition of Amorphous Hydrogenated Carbon Films in Low and High Frequency Discharges
1991
Mass spectrometry of a silane glow discharge during plasma deposition of a-Si: H films
1980
Diagnostics of CH/sub 4/ plasmas used for diamond-like carbon deposition
1990
Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphous carbon
1986
Contribution de l'ionisation des atomes excites a la production des ions H+ dans une decharge en haute frequence dans l'hydrogene
1973
Deposition of carbon films by the dissociation of methane in r.f. discharge
1991
Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
1984
A kinetic model for radio frequency plasma-activated chemical vapour deposition
1978
Infrared absorption of hydrogenated amorphous SiC and GeC films
1980
Optical emission spectroscopy for diagnostic and monitoring of CH4plasmas used for a-C:H deposition
1990
Properties of silicon nitride films produced by r.f. plasma-activated chemical vapor deposition
1977