V. Kouznetsov

The M+1AX phases: Materials science and thin-film processing

Deposition of Ti thin film using the magnetron sputtering method

2D metal carbides and nitrides (MXenes) for energy storage

Plasma and ion sources in large area coating: A review

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopy

Surface modification of titanium, titanium alloys, and related materials for biomedical applications

Graphene-Like Two-Dimensional Materials

X-ray photoelectron spectroscopy: Towards reliable binding energy referencing

Surface technology for automotive engineering

Are MXenes Promising Anode Materials for Li Ion Batteries? Computational Studies on Electronic Properties and Li Storage Capability of Ti₃C₂ and Ti₃C₂X₂ (X = F, OH) Monolayer

Industrial Applications of Pulsed Power Technology

Thin chalcogenide films prepared by pulsed laser deposition – new amorphous materials applicable in optoelectronics and chemical sensors

Surface integrity in material removal processes: Recent advances

25th Anniversary Article: MXenes: A New Family of Two‐Dimensional Materials

Influence of high power densities on the composition of pulsed magnetron plasmas

Granulated metal nanostructure deposited by laser ablation accompanied by cascade drop fission

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

A novel pulsed magnetron sputter technique utilizing very high target power densities