M.S. Akbar

Advanced polyimide materials: Syntheses, physical properties and applications

Zirconium-Based Compounds for Cathode of Polymer Electrolyte Fuel Cell

Recent advancements in Pt and Pt-free catalysts for oxygen reduction reaction

Surface reaction mechanisms for atomic layer deposition of silicon nitride

Bias-temperature instabilities and radiation effects in MOS devices

A review on non-precious metal electrocatalysts for PEM fuel cells

Non-thermal plasmas in and in contact with liquids

Suppression of DC bias stress-induced degradation of organic field-effect transistors using postannealing effects

Environment of hafnium and silicon in Hf-based dielectric films: An atomistic study by x-ray absorption spectroscopy and x-ray diffraction

Lab-on-Skin: A Review of Flexible and Stretchable Electronics for Wearable Health Monitoring

Anti-Ferroelectric Ceramics for High Energy Density Capacitors

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Threshold voltage instabilities in high-/spl kappa/ gate dielectric stacks

High dielectric constant gate oxides for metal oxide Si transistors

Effective Surface Passivation by Novel $\hbox{SiH}_{4}$ –$\hbox{NH}_{3}$ Treatment and BTI Characteristics on Interface-Engineered High-Mobility $\hbox{HfO}_{2}$-Gated Ge pMOSFETs

CMOS‐Technology‐Enabled Flexible and Stretchable Electronics for Internet of Everything Applications

Point defects in HfO2 high K gate oxide

Radiation Effects in MOS Oxides

Perovskite lead-free dielectrics for energy storage applications

Propagation velocity and photoemission intensity of a local discharge on an electrolytic surface

High Performance Multilayer MoS₂ Transistors with Scandium Contacts

Magnetic resonance studies of trapping centers in high-/spl kappa/ dielectric films on silicon

Electrical characterization and material evaluation of zirconium oxynitride gate dielectric in TaN-gated NMOSFETs with high-temperature forming gas annealing

High-performance TaN/HfSiON/Si metal-oxide-semiconductor structures prepared by NH3 post-deposition anneal

Threshold voltage instability characteristics under positive dynamic stress in ultrathin HfO2 metal-oxide-semiconductor field-effect transistors

Bias-temperature instabilities of polysilicon gate HfO/sub 2/ MOSFETs

Pressure Dependence of DC Breakdown of Contaminated Insulators

Performance of polysilicon gate HfO₂ MOSFETs on [100] and [111] silicon substrates

Piezoelectric and pyroelectric properties of Sr-doped PZT (PSZT) with minor manganese additions

Thickness dependence of Weibull slopes of HfO₂ gate dielectrics