Mark Ming‐Cheng Cheng

The future transistors

Scalable integration of hybrid high-κ dielectric materials on two-dimensional semiconductors

Thermally oxidized 2D TaS ₂ as a high- κ gate dielectric for MoS ₂ field-effect transistors

High Mobility WSe₂ p- and n-Type Field-Effect Transistors Contacted by Highly Doped Graphene for Low-Resistance Contacts