Citation Impact
Citing Papers
In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3 Thin Films from Trimethylaluminum and Water
2000
Alternative Plasmonic Materials: Beyond Gold and Silver
2013 Standout
Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier dystem
2009 StandoutNobel
Platinum single-atom and cluster catalysis of the hydrogen evolution reaction
2016 Standout
Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
1999
Initial Reactions in Chemical Vapor Deposition of Ta2O5from TaCl5and H2O. An Ab Initio Study
2000
Comparative study on electrical properties of atomic layer deposited high-permittivity materials on silicon substrates
2004
Atomic Layer Deposition of Ta2O5 Using the TaI5 and O2 Precursor Combination
2003
Formation of Metal Oxide Particles in Atomic Layer Deposition During the Chemisorption of Metal Chlorides: A Review
2005
Anomalous effect of temperature on atomic layer deposition of titanium dioxide
2000
Atomic Layer Deposition Functionalized Composite SOFC Cathode La0.6Sr0.4Fe0.8Co0.2O3-δ -Gd0.2Ce0.8O1.9: Enhanced Long-Term Stability
2013 StandoutNobel
Properties of atomic layer deposited (Ta1−xNbx)2O5 solid solution films and Ta2O5–Nb2O5 nanolaminates
1999
Atomic Layer Deposition: An Overview
2009 Standout
Influence of atomic layer deposition parameters on the phase content of Ta2O5 films
2000
Photo-Induced Atomic Layer Deposition of Tantalum Oxide Thin Films from Ta(OC[sub 2]H[sub 5])[sub 5] and O[sub 2]
2003
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
2003
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
1998
Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor
2007
In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water
2001
Real-Time Monitoring in Atomic Layer Deposition of TiO2 from TiI4 and H2O−H2O2
2000
In Situ Mass Spectrometry Study on Atomic Layer Deposition from Metal (Ti, Ta, and Nb) Ethoxides and Water
2001
Atomic Layer Deposition and Chemical Vapor Deposition of Tantalum Oxide by Successive and Simultaneous Pulsing of Tantalum Ethoxide and Tantalum Chloride
2000
High-κ gate dielectrics: Current status and materials properties considerations
2001 Standout
Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films
2007
ZnO Nanostructures for Dye‐Sensitized Solar Cells
2009 Standout
Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process
1998
Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor
2000
Works of L. Pung being referenced
Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O
1996
Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature
2005
Optical characterization of HfO2 thin films grown by atomic layer deposition
2004
Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
2004