Citation Impact
Citing Papers
Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
2003 Standout
Nanoscale zero-valent iron: Future prospects for an emerging water treatment technology
2011 Standout
Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances
2012 Standout
Prospects of Colloidal Nanocrystals for Electronic and Optoelectronic Applications
2009 Standout
One Volt Organic Transistor
2005
Effects of radiation and charge trapping on the reliability of high- κ gate dielectrics
2004
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
2001
Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
2001
Fatigue-free ferroelectric capacitors with platinum electrodes
1995 StandoutNature
High dielectric constant oxides
2004 Standout
Raman scattering inHf x Zr 1 − x O 2
2005 StandoutNobel
A Quantum Chemical Study of the Atomic Layer Deposition of Al2O3 Using AlCl3 and H2O as Precursors
2004
Nanofabricated and self-assembled magnetic structures as data storage media
2005
A review of Ga2O3 materials, processing, and devices
2018 Standout
Growth of yttrium oxide thin films from β‐diketonate precursor
1994
ZnO – nanostructures, defects, and devices
2007 Standout
Total ionizing dose effects in MOS oxides and devices
2003 Standout
Solid-Solution Nanoparticles: Use of a Nonhydrolytic Sol−Gel Synthesis To Prepare HfO2 and HfxZr1-xO2 Nanocrystals
2004 StandoutNobel
Trends in the development of ULSI DRAM capacitors
1994
Inductively coupled plasma etch damage in (-201) Ga2O3 Schottky diodes
2017
Organic Airborne Molecular Contamination in Semiconductor Fabrication Clean Rooms
2006 Standout
Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor
2003
Device Physics of Solution‐Processed Organic Field‐Effect Transistors
2005 Standout
Recent progress in processing and properties of ZnO
2003
Interactions of moisture and organic contaminants with SiO2 and ZrO2 gate dielectric films
2003
Boron penetration studies from p+ polycrystalline Si through HfSixOy
2002
Thermally Stimulated Current Measurements on Irradiated MOS Capacitors
1983
Electrical characteristics of highly reliable ultrathin hafnium oxide gate dielectric
2000
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2005 Standout
Threshold voltage instabilities in high-/spl kappa/ gate dielectric stacks
2005
High dielectric constant gate oxides for metal oxide Si transistors
2005 Standout
Low dielectric constant materials for microelectronics
2003 Standout
Photoemission and ab initio theoretical study of interface and film formation during epitaxial growth and annealing of praseodymium oxide on Si(001)
2002
Suppressed crystallization of Hf-based gate dielectrics by controlled addition of Al2O3 using atomic layer deposition
2002
Reaction–diffusion in high-k dielectrics on Si
2003
Mechanism and kinetics of thin zirconium and hafnium oxide film growth in an ALD reactor
2003
Rare-earth oxide thin films as gate oxides in MOSFET transistors
2003
The restaurant at the end of the random walk: recent developments in the description of anomalous transport by fractional dynamics
2004 Standout
Inductively coupled plasma etching of bulk, single-crystal Ga2O3
2017
Towards understanding epitaxial growth of alternative high-K dielectrics on Si(001): Application to praseodymium oxide
2003
Metal–Oxide RRAM
2012 Standout
Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition
2003
Radiation Effects in MOS Oxides
2008 Standout
Imaging the Photoionization of Individual CdSe/CdS Core−Shell Nanocrystals on n- and p-Type Silicon Substrates with Thin Oxides
2004 StandoutNobel
Exchange bias in nanostructures
2005 Standout
Perovskite lead-free dielectrics for energy storage applications
2018 Standout
High-κ gate dielectrics: Current status and materials properties considerations
2001 Standout
Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films
2002
Effect of high-density plasma etching on the optical properties and surface stoichiometry of ZnO
2002
Atomic layer deposition of HfO2 thin films and nanolayered HfO2–Al2O3–Nb2O5 dielectrics
2003
Works of L. Manchanda being referenced
The nature of intrinsic hole traps in thermal silicon dioxide
1981
Gate capacitance attenuation in MOS devices with thin gate dielectrics
1996
Thickness dependence of boron penetration through O/sub 2/- and N/sub 2/O-grown gate oxides and its impact on threshold voltage variation
1996
Crystallization kinetics in amorphous (Zr0.62Al0.38)O1.8 thin films
2001
Growth temperature dependence of the Si(001)/SiO2 interface width
1994
Yttrium oxide/silicon dioxide: a new dielectric structure for VLSI/ULSI circuits
1988
Multi-component high-K gate dielectrics for the silicon industry
2001
A new method to fabricate thin oxynitride/oxide gate dielectric for deep submicron devices
1993
Study of thermally oxidized yttrium films on silicon
1987
Etching of high-k dielectric Zr1−xAlxOy films in chlorine-containing plasmas
2001
Rapid thermal oxidation of silicon in N2O between 800 and 1200 °C: Incorporated nitrogen and interfacial roughness
1994