Immediate Impact
2 hit
Citing Papers
Next generation ferroelectric materials for semiconductor process integration and their applications
2021 Hit
Review and perspective on ferroelectric HfO2-based thin films for memory applications
2018 Hit
Works of Kyung Do Kim being referenced
Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition
2016
Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
2015