K. Guinn

Alternative Plasmonic Materials: Beyond Gold and Silver

Thin film processing using S-layer proteins: Biotemplated assembly of colloidal gold etch masks for fabrication of silicon nanopillar arrays

Self-Assembly of “S-Bilayers”, a Step Toward Expanding the Dimensionality of S-Layer Assemblies

Fe2+-based layered porous coordination polymers and soft encapsulation of guests via redox activity

6. Molecular Spectroscopy Techniques Applied for Processing Plasma Diagnostics

A review of Ga2O3 materials, processing, and devices

ZnO – nanostructures, defects, and devices

Inductively coupled plasma etch damage in (-201) Ga2O3 Schottky diodes

Recent progress in processing and properties of ZnO

Reactive species in non-equilibrium atmospheric-pressure plasmas: Generation, transport, and biological effects

Low dielectric constant materials for microelectronics

Predicting Adsorption Isotherms of Low-Volatile Compounds by Temperature Programmed Desorption:  Iodine on Carbon

Inductively coupled plasma etching of bulk, single-crystal Ga2O3

High density plasma etching of low k dielectric polymers in oxygen-based chemistries

Silicides and ohmic contacts

High Performance Silicon Nanowire Field Effect Transistors

Effect of high-density plasma etching on the optical properties and surface stoichiometry of ZnO

Thermal desorption over wide pressure ranges applied to characterization of equilibrium adsorption of CO over Pt

Quantitative chemical topography of polycrystalline Si anisotropically etched in Cl2/O2 high density plasmas

Mechanism for anisotropic etching of photoresist-masked, polycrystalline silicon in HBr plasmas

Competitive halogenation of silicon surfaces in HBr/Cl2 plasmas studied with x-ray photoelectron spectroscopy and in situ, real-time, pulsed laser-induced thermal desorption