Immediate Impact
30 hit
Citing Papers
Predictive models for the surface roughness and subsurface damage depth of semiconductor materials in precision grinding
2025 Hit
A novel liquid film shearing polishing technique for silicon carbide and its processing damage mechanisms
2025 Hit
Works of Jinhu Wang being referenced
Force Rheological Polishing Technology
2022
Review on Material Removal Model of Flexible Contact Polishing Based on Rheological Principle
2020
Author Peers
Peers are selected by citation overlap in the author's most active subfields. citations · hero ref
| Author | Last Decade | Papers | Cites | |||||
|---|---|---|---|---|---|---|---|---|
| Jinhu Wang | 97 | 90 | 59 | 53 | 51 | 55 | 387 | |
| Xu Zhu | 80 0.8× | 50 0.6× | 26 0.4× | 35 0.7× | 13 0.3× | 48 | 429 | |
| Liu Da | 44 0.5× | 34 0.4× | 53 0.9× | 44 0.8× | 31 0.6× | 48 | 362 | |
| Jun Ren | 63 0.6× | 97 1.1× | 20 0.3× | 90 1.7× | 28 0.5× | 59 | 348 | |
| Yanfeng Yang | 39 0.4× | 180 2.0× | 35 0.6× | 68 1.3× | 43 0.8× | 33 | 377 | |
| Peng Yu | 77 0.8× | 84 0.9× | 20 0.3× | 32 0.6× | 50 1.0× | 38 | 445 | |
| A. F. Ali | 73 0.8× | 49 0.5× | 17 0.3× | 17 0.3× | 25 0.5× | 91 | 362 | |
| Xinxin Guo | 71 0.7× | 59 0.7× | 36 0.6× | 49 0.9× | 11 0.2× | 37 | 396 | |
| Fengjun Wang | 67 0.7× | 42 0.5× | 93 1.6× | 23 0.4× | 12 0.2× | 35 | 422 | |
| Chaoran Wang | 62 0.6× | 112 1.2× | 48 0.8× | 15 0.3× | 11 0.2× | 37 | 374 | |
| Hongbo Guo | 109 1.1× | 43 0.5× | 23 0.4× | 51 1.0× | 8 0.2× | 43 | 441 |
All Works
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