G. Weise

Synthesis of Large‐Area MoS₂ Atomic Layers with Chemical Vapor Deposition

Single‐Layer Semiconducting Nanosheets: High‐Yield Preparation and Device Fabrication

Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering

Engineering the surface structure of MoS2 to preferentially expose active edge sites for electrocatalysis

Fundamentals of zinc oxide as a semiconductor

p-type behavior in phosphorus-doped (Zn,Mg)O device structures

6. Molecular Spectroscopy Techniques Applied for Processing Plasma Diagnostics

A comprehensive review of ZnO materials and devices

ZnO – nanostructures, defects, and devices

Thin films of fullerene-like MoS2 nanoparticles with ultra-low friction and wear

Diamond-like amorphous carbon

XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions

Nanomechanical and nanotribological properties of carbon-based thin films: A review

Recent progress in processing and properties of ZnO

Reactive species in non-equilibrium atmospheric-pressure plasmas: Generation, transport, and biological effects

Synthesis of MoS₂ and MoSe₂ Films with Vertically Aligned Layers

Recent advances in processing of ZnO

Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films

Transport properties of phosphorus-doped ZnO thin films

Improved nanoindentation and microwave shielding properties of modified MWCNT reinforced polyurethane composites

Bioactive materials

Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films

Ion bombardment diagnostics in a nitrogen RF magnetron sputtering discharge

Preparation, characterization and properties of pure and lithium-doped zinc oxide thin films

Plasma diagnostic studies to the carbon nitride film deposition by reactive r.f. magnetron sputtering

Preparation, structure and properties of MoSx films

Structure and Properties of MoS₂ Films

Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films