Standout Papers

Low-Temperature Al<sub>2</sub>O<sub>3</sub> Atomic Layer Deposition 2002 2026 2010 2018 1.2k
  1. Low-Temperature Al2O3 Atomic Layer Deposition (2004)
    Markus D. Groner, F. Fabreguette et al. Chemistry of Materials
  2. Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates (2002)
    Markus D. Groner, Jeffrey W. Elam et al. Thin Solid Films

Immediate Impact

4 by Nobel laureates 38 from Science/Nature 96 standout
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2 intermediate papers

Works of F. Fabreguette being referenced

Low-Temperature Al2O3 Atomic Layer Deposition
2004 Standout
Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates
2002 Standout

Author Peers

Author Last Decade Papers Cites
F. Fabreguette 1993 1732 280 375 26 2.6k
Ming‐Min Yang 930 1362 137 711 43 1.9k
Anupam Giri 877 1531 452 475 42 2.3k
Yuping He 974 1601 108 505 68 2.5k
Qiye Zheng 669 1277 121 336 35 1.9k
Declan Scullion 647 1961 120 184 14 2.3k
S. Kassavetis 695 985 437 327 52 1.7k
G. A. J. Amaratunga 835 2746 517 239 46 3.1k
Satyaprakash Sahoo 1027 1817 121 532 84 2.4k
Yan Gao 1338 1219 398 503 42 2.4k
Ganapathiraman Ramanath 717 1522 71 312 36 2.1k

All Works

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